刘佳敏｜华中科技大学｜学者主页

2026

Fast EUV mask optimization via error-guided stochastic search

Zhilong Zhong, Jiamin Liu, Pinxuan He, Honggang Gu, Hao Jiang, Qi Xia, Shiyuan Liu

Optics & Laser Technology

2026

L2-CPI: high-resolution computational phase imaging with an arbitrary field of view

Zedi Li, Jinsong Zhang, Hang zhao, Wenyu Chen, Xiaobo Deng, Jiamin Liu, Hao Jiang, Hui Deng, Renjie Zhou, Nicholas X. Fang, Liang Gao, Shiyuan Liu, Jinlong Zhu

Light Advanced Manufacturing

DOI

2025

Quasi-visualizable detection of deep subwavelength defects in patterned wafers by breaking the optical form birefringence

Jiamin Liu, Jinlong Zhu, Zhe Yu, Xianrui Feng, Zedi Li, Lei Zhong, Jinsong Zhang, Honggang Gu, Xiuguo Chen, Hao Jiang, Shiyuan Liu

International Journal of Extreme Manufacturing

2025

Information theoretical computational lithography based on pattern density statistics

Bingyang Wang, Xu Ma, Jiamin Liu, Hao Jiang, Shiyuan Liu, Gonzalo R. Arce

Optics Express

DOI

2025

Pushing the resolution limit of coherent diffractive imaging

Li Liu, Jing Hong Du, Bailin Zhuang, Ming Jia Gong, Jiamin Liu, Honggang Gu, Shiyuan Liu

Light Science & Applications

DOI

2025

Large-scale electromagnetic simulations enabled by the modified Born series with virtual absorbing boundaries

Pinxuan He, Jiamin Liu, Honggang Gu, Hao Jiang, Shiyuan Liu

DOI

2024

Ensemble Learning-Fused Solution to the Inverse Problem in Integrated Optical Critical Dimension Metrology

Chunfu Guo, Jiamin Liu, Honggang Gu, Jinlong Zhu, Chuanwei Zhang, Xiuguo Chen, Hao Jiang, Shiyuan Liu

IEEE Transactions on Instrumentation and Measurement

DOI

2024

Modified Born series with virtual absorbing boundary enabling large-scale electromagnetic simulation

Pinxuan He, Jiamin Liu, Honggang Gu, Hao Jiang, Shiyuan Liu

Communications Physics

DOI

2024

Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography

Yaobin Feng, Jiamin Liu, Hao Jiang, Shiyuan Liu

Photonics

DOI

2024

Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer

Yaobin Feng, Jiamin Liu, Zhiyang Song, Hao Jiang, Shiyuan Liu

Frontiers of Mechanical Engineering

DOI

2023

Development and Calibration of a Vertical High-Speed Mueller Matrix Ellipsometer

Jiamin Liu, Song Zhang, Bowen Deng, Lei Li, Honggang Gu, Jinlong Zhu, Hao Jiang, Shiyuan Liu

Photonics

DOI

2022

集成电路制造在线光学测量检测技术：现状、挑战与发展趋势

陈修国，王才，杨天娟，刘佳敏，罗成峰，刘世元

《激光与光电子学进展》

2022

Optical wafer defect inspection at the 10 nm technology node and beyond

Jinlong Zhu, Jiamin Liu, Tianlai Xu, Shuai Yuan, Zexu Zhang, Hao Jiang, Honggang Gu, Renjie Zhou, Shiyuan Liu

International Journal of Extreme Manufacturing

2019

Characterization of beam splitter using Mueller matrix ellipsometry

Song Zhang, Jiamin Liu, Hao Jiang, Shiyuan Liu

Tenth International Symposium on Precision Engineering Measurements and Instrumentation

DOI

2018

Characterization of beam splitters in the calibration of a six-channel Stokes polarimeter

Song Zhang, Honggang Gu, Jiamin Liu, Hao Jiang, Xiuguo Chen, Chuanwei Zhang, Shiyuan Liu

Journal of Optics

DOI

刘佳敏

精选作品

期刊论文

Fast EUV mask optimization via error-guided stochastic search

L2-CPI: high-resolution computational phase imaging with an arbitrary field of view

Quasi-visualizable detection of deep subwavelength defects in patterned wafers by breaking the optical form birefringence

Information theoretical computational lithography based on pattern density statistics

Pushing the resolution limit of coherent diffractive imaging

Large-scale electromagnetic simulations enabled by the modified Born series with virtual absorbing boundaries

Ensemble Learning-Fused Solution to the Inverse Problem in Integrated Optical Critical Dimension Metrology

Modified Born series with virtual absorbing boundary enabling large-scale electromagnetic simulation

Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography

Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer

Development and Calibration of a Vertical High-Speed Mueller Matrix Ellipsometer

集成电路制造在线光学测量检测技术：现状、挑战与发展趋势

Optical wafer defect inspection at the 10 nm technology node and beyond

Characterization of beam splitter using Mueller matrix ellipsometry

Characterization of beam splitters in the calibration of a six-channel Stokes polarimeter

研究方向