张泽芳｜上海工程技术大学｜学者主页

2026

Study on the Synergistic Effect of Water-soluble Polymers on the Surface Properties of Silicon Wafers

Peng Zhao, Yulin Chen, Jige Wang, Zhiyuan Zhao, Meng Yang, Zefang Zhang

Silicon

DOI

2025

SiC抛光用碱性活化H2O2浆料稳定性研究

王凯悦，白九伟，武海涛，吕功，刘桐，张泽芳

《铸造设备与工艺》

DOI

2025

Correction: Unprecedented developed composite polishing system to achieve atomic surface integrating rough and fine polishing using a novel hyper-conjugated pad through controlling the temperature of a proposed green slurry

Feng Lan Zhao, Zhenyu Zhang, Zhenyu Zhang, Hongxiu Zhou, Leilei Chen, Kuo Hai, Jiahao Yu, Jiahao Yu, Zefang Zhang, Zefang Zhang, Cheng Fan

Advanced Composites and Hybrid Materials

DOI

2025

Unprecedented developed composite polishing system to achieve atomic surface integrating rough and fine polishing using a novel hyper-conjugated pad through controlling the temperature of a proposed green slurry

Feng Lan Zhao, Zhenyu Zhang, Zhenyu Zhang, Hongxiu Zhou, Leilei Chen, Kuo Hai, Jiahao Yu, Jiahao Yu, Zefang Zhang, Zefang Zhang, Cheng Fan

Advanced Composites and Hybrid Materials

DOI

2025

The Influence of Inorganic Fillers in TDI-based Polyurethane Pad for Sapphire Substrate Chemical Mechanical Polishing

Yiming Meng, Shiqiang Song, Zefang Zhang, Shanduan Zhang

ECS Journal of Solid State Science and Technology

DOI

2025

Effect of Structurally Modified Toluene Diisocyanate-Based Polyurethane Pads on Chemical Mechanical Polishing of 4H Silicon Carbide Substrate

Yiming Meng, Shanduan Zhang, Zefang Zhang

Polymers

DOI

2024

Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers

Bowen Jiang, Jie Guan, Peng Zhao, Yulin Chen, Zefang Zhang

Crystals

DOI

2024

Synthesis of Al2O3@MnO2 composite abrasives and their chemical mechanical polishing performance on silicon carbide (SiC)

Peijia Zhang, Hong Lei, Zefang Zhang, Jianhua Zhang, Shi-Dong Chen, Xiaogang Hu

Ceramics International

DOI

2023

Structure-Performance Relationships of Complexing Agents on the Chemical Mechanical Polishing of 6063 Aluminum Alloy

Yan-Pei Li, Mengfei Xi, Bowen Jiang, Xing'ai Li, Yan-Feng Zhang, Zefang Zhang

ECS Journal of Solid State Science and Technology

DOI

2023

Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate

Wei Zhang, Hong Lei, Wenqing Liu, Zefang Zhang, Yi Chen, Xiaogang Hu, Xiangshan Ye

Materials Chemistry and Physics

DOI

2022

Effect of the carboxyl group number of the complexing agent on polishing performance of alumina slurry in sapphire CMP

Wei Zhang, H. Lei, Wenqing Liu, Zefang Zhang

Ceramics International

DOI

2022

Single crystal silicon wafer polishing by pretreating pad adsorbing SiO2 grains and abrasive-free slurries

Zhengzheng Bu, Feng-Lian Niu, Jia-Peng Chen, Zhen-Lin Jiang, Wenjun Wang, Xuehan Wang, Hanqiang Wang, Zefang Zhang, Yong Zhu, Tao Sun

Materials Science in Semiconductor Processing

DOI

2022

Two-Step Chemical Mechanical Polishing of Stainless Steel

Xing'ai Li, Mengfei Xi, Wei Guo, Gui-Mei Xu, W. Luo, Qinqi Zhu, Yan-Pei Li, Haiyang Yu, T. Chang, Yan-Feng Zhang, Zefang Zhang, Tao Sun

ECS Journal of Solid State Science and Technology

DOI

2022

Synthesis, characterization of CeO2@ZIF-8 composite abrasives and their chemical mechanical polishing behavior on glass substrate

Xiaoyue Yuan, Chuandong Chen, Lei Hong, Zefang Zhang

Ceramics International

DOI

2022

Preparation of the Nanodiamond@SiO2 Abrasive and its Effect on the Polishing Performance of Zirconia Ceramics

R. Ding, H. Lei, Ru-Dong Chen, Zefang Zhang

ECS Journal of Solid State Science and Technology

DOI

2021

Electrostatic Self-Assembled Composite Abrasives for Chemical Mechanical Polishing of A-Plane Sapphire

Yan-Feng Zhang, Hai-Yang Yu, Xiaoxue Tang, Xue Kong, Xing'ai Li, Yan-Pei Li, Mengfei Xi, T. Chang, Danni Meng, Senlin Yang, Wanying Guo, Zefang Zhang, Pin-Hua Rao

ECS Journal of Solid State Science and Technology

DOI

2017

Study on Chemical Mechanical Polishing Performances of Sapphire Wafer (0001) Using Silica-Based Slurry

Zefang Zhang, Wenjuan Zhang, Shan-Duan Zhang, Wei-Xia Yan

DOI

2016

Evaluation of oxide chemical mechanical polishing performance of polystyrene coated ceria hybrid abrasives

Ai-Lian Chen, Zefang Zhang, Xia-Zhang Li, Yang Chen

Journal of materials science. Materials in electronics

DOI

2015

Effect of Abrasive Concentration on Chemical Mechanical Polishing of Sapphire

Wei-Xia Yan, Zefang Zhang, Xiao-Hui Guo, Wei-Li Liu, Zhitang Song

DOI

2015

The Effect of pH on Sapphire Chemical Mechanical Polishing

Wei-Xia Yan, Zefang Zhang, Xiao-Hui Guo, Wei-Li Liu, Zhitang Song

DOI

2015

Synthesis of colloid silica coated with ceria nano-particles with the assistance of PVP

Lei-Ping Yu, Wei-Li Liu, Zefang Zhang, Zhitang Song

DOI

2014

Iron trichloride as oxidizer in acid slurry for chemical mechanical polishing of Ge2Sb2Te5

Wei-Xia Yan, Liangyong Wang, Zefang Zhang, Wei-Li Liu, Zhitang Song

DOI

2014

Effect of the Hydrogen Peroxide on the Ti0.4Sb2Te3 Chemical Mechanical Polishing in Acidic Slurry

Wei-Xia Yan, Wei-Li Liu, Xiao-Hui Guo, Zefang Zhang, Chen-Liang Liang, Zhitang Song

DOI

2013

纳米SiO2抛光液的制备及在蓝宝石抛光中的应用

张泽芳，侯蕾，闫未霞，刘卫丽，宋志棠

《润滑与密封》

2012

不同碱和分散剂对蓝宝石基片研磨的影响

张泽芳，刘卫丽，宋志棠

《半导体技术》

2012

Chemical Mechanical Polishing of Ge 2 Sb 2 Te 5 Using Abrasive-Free Solutions of Iron Trichloride

Wei-Xia Yan, Liangyong Wang, Zefang Zhang, Ao-Dong He, M. Zhong, Wei-Li Liu, Liang-Cai Wu, Zhitang Song

DOI

2012

Chemical mechanical polishing of stainless steel foil as flexible substrate

Xiao-Kai Hu, Zhitang Song, Wei-Li Liu, F. Qin, Zefang Zhang, Hai-Bo Wang

DOI

2012

Effects of Different Alkaline Agents and Dispersant on the Lapping of Sapphire Substrate

Zefang Zhang, Wei-Li Liu, Zhi-Tang Song

2011

Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing

Zefang Zhang, Wei-Xia Yan, Lei Zhang, Wei-Li Liu, Zhitang Song

DOI

2011

Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper

Lei Zhang, Hai-Bo Wang, Zefang Zhang, F. Qin, Wei-Li Liu, Zhitang Song

DOI

2011

Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing

Zefang Zhang, Wei-Li Liu, Zhitang Song

DOI

2010

Effect of ammonium molybdate concentration on chemical mechanical polishing of glass substrate

Zefang Zhang, Wei-Li Liu, Zhitang Song

DOI

2010

Two-Step Chemical Mechanical Polishing of Sapphire Substrate

Zefang Zhang, Wei-Li Liu, Zhitang Song, Xiao-Kai Hu

DOI

2010

Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate

Zefang Zhang, Lei-Ping Yu, Wei-Li Liu, Zhitang Song

DOI

2010

Effect of pH and Abrasive Concentration on Chemical Mechanical Polishing of Ge2Sb2Te5

Zefang Zhang, Wei-Li Liu, Zhitang Song

DOI

2010

Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry.

Zefang Zhang, Wei-Li Liu, Zhitang Song

Applied Optics

DOI

2010

Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application

Xiao-Kai Hu, Zhitang Song, Hai-Bo Wang, Wei-Li Liu, Zefang Zhang

DOI

2010

Synthesis, characterization of ceria-coated silica particles and their chemical mechanical polishing performance on glass substrate

Zefang Zhang, Wei-Li Liu, Jing-Kang Zhu, Zhitang Song

DOI

2010

Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate

Zefang Zhang, Wei-Li Liu, Zhitang Song

DOI

2009

Synthesis of Spherical-like Ceria Particle with PVP as Assistant Agent and Its CMP Performance on Shallow Trench Isolation

Zefang Zhang, Wei-Li Liu, Zhitang Song, Xiao-Kai Hu

DOI

2008

Preparation of α-alumina/polymethacrylic acid composite abrasive and its CMP performance on glass substrate

Zefang Zhang, H. Lei

DOI

2008

Polishing Performances of α-alumina/Polymethacrylic Acid Composite Abrasive

Zefang Zhang

精选作品

期刊论文

Study on the Synergistic Effect of Water-soluble Polymers on the Surface Properties of Silicon Wafers

SiC抛光用碱性活化H2O2浆料稳定性研究

Correction: Unprecedented developed composite polishing system to achieve atomic surface integrating rough and fine polishing using a novel hyper-conjugated pad through controlling the temperature of a proposed green slurry

Unprecedented developed composite polishing system to achieve atomic surface integrating rough and fine polishing using a novel hyper-conjugated pad through controlling the temperature of a proposed green slurry

The Influence of Inorganic Fillers in TDI-based Polyurethane Pad for Sapphire Substrate Chemical Mechanical Polishing

Effect of Structurally Modified Toluene Diisocyanate-Based Polyurethane Pads on Chemical Mechanical Polishing of 4H Silicon Carbide Substrate

Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers

Synthesis of Al2O3@MnO2 composite abrasives and their chemical mechanical polishing performance on silicon carbide (SiC)

Structure-Performance Relationships of Complexing Agents on the Chemical Mechanical Polishing of 6063 Aluminum Alloy

Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate

Effect of the carboxyl group number of the complexing agent on polishing performance of alumina slurry in sapphire CMP

Single crystal silicon wafer polishing by pretreating pad adsorbing SiO2 grains and abrasive-free slurries

Two-Step Chemical Mechanical Polishing of Stainless Steel

Synthesis, characterization of CeO2@ZIF-8 composite abrasives and their chemical mechanical polishing behavior on glass substrate

Preparation of the Nanodiamond@SiO2 Abrasive and its Effect on the Polishing Performance of Zirconia Ceramics

Electrostatic Self-Assembled Composite Abrasives for Chemical Mechanical Polishing of A-Plane Sapphire

Study on Chemical Mechanical Polishing Performances of Sapphire Wafer (0001) Using Silica-Based Slurry

Evaluation of oxide chemical mechanical polishing performance of polystyrene coated ceria hybrid abrasives

Effect of Abrasive Concentration on Chemical Mechanical Polishing of Sapphire

The Effect of pH on Sapphire Chemical Mechanical Polishing

Synthesis of colloid silica coated with ceria nano-particles with the assistance of PVP

Iron trichloride as oxidizer in acid slurry for chemical mechanical polishing of Ge2Sb2Te5

Effect of the Hydrogen Peroxide on the Ti0.4Sb2Te3 Chemical Mechanical Polishing in Acidic Slurry

纳米SiO2抛光液的制备及在蓝宝石抛光中的应用

不同碱和分散剂对蓝宝石基片研磨的影响

Chemical Mechanical Polishing of Ge 2 Sb 2 Te 5 Using Abrasive-Free Solutions of Iron Trichloride

Chemical mechanical polishing of stainless steel foil as flexible substrate

Effects of Different Alkaline Agents and Dispersant on the Lapping of Sapphire Substrate

Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing

Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper

Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing

Effect of ammonium molybdate concentration on chemical mechanical polishing of glass substrate

Two-Step Chemical Mechanical Polishing of Sapphire Substrate

Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate

Effect of pH and Abrasive Concentration on Chemical Mechanical Polishing of Ge2Sb2Te5

Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry.

Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application

Synthesis, characterization of ceria-coated silica particles and their chemical mechanical polishing performance on glass substrate

Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate

Synthesis of Spherical-like Ceria Particle with PVP as Assistant Agent and Its CMP Performance on Shallow Trench Isolation

Preparation of α-alumina/polymethacrylic acid composite abrasive and its CMP performance on glass substrate

Polishing Performances of α-alumina/Polymethacrylic Acid Composite Abrasive

会议论文

水玻璃为原料制备纳米氧化硅磨料及应用于硅片抛光(英文)

研究方向