李艳秋

2026

基于四波横向剪切干涉的高数值孔径球面波前畸变测量（特邀）

《光学学报》

2025

混合面型极紫外光刻物镜优化设计

《光学技术》

2025

利用多方向差分Zernike多项式拟合的任意孔径波前重构

《光学学报》

2025

偏振相机-液晶混合的反射式缪勒显微镜

《光学学报》

2025

Calibration of alignment errors of quadriwave lateral shearing interferometer for testing high numerical aperture spherical wave with oblique incidence

Optics and Lasers in Engineering

DOI

2025

Wavefront fitting of different obscuration shapes in anamorphic extreme ultraviolet lithography projection objective

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2025

Design of a grazing incidence illumination system for anamorphic extreme ultraviolet lithography

Applied Optics

DOI

2025

Fast optical proximity correction method adopting an iterative threshold algorithm of log-sum regularization compressive sensing

Applied Optics

DOI

2025

Automatic detection technology and application of high-performance Stokes-Mueller imaging polarimeter

DOI

2024

波片快轴角对空间调制偏振测量精度的影响

《光学学报》

2024

Quantitative design for compensator in aspheric non-null interferometry with extended measurement range

Optics Communications

DOI

2024

Phase microscopy using the quadriwave lateral shearing interferometer with continuously variable shear ratio

DOI

2024

Fast and direct calibration for high numerical aperture quadriwave lateral shearing interferometry using geometry model with higher-order Taylor expansion

Applied Optics

DOI

2024

In situ calibration of shear ratio for quadriwave lateral shearing interferometry using double-slit interference

Applied Optics

DOI

2024

Zernike polynomial-based pupil wavefront optimization technology for extreme ultraviolet lithography

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2024

Fast curvilinear optical proximity correction adopting quasi-uniform B-spline curves

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2024

High-performance Mueller matrix imaging polarimeter based on liquid crystal variable retarders

DOI

2024

Fast lithographic source optimization adopting RMSProp with iterative shrinkage-thresholding algorithm compressive sensing for high fidelity patterning

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2024

Enabling source and mask optimization by a dynamic aberration imaging model across the full exposure field

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2024

Allocation method of micromirror array for deep ultraviolet illumination system

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2024

Fast source mask optimization adopting mask prediction and feedback method with similarity penalty

Applied Optics

DOI

2024

Holistic and in situ calibration method for a spectral-temporally modulated Mueller spectropolarimeter

Applied Optics

DOI

2024

High efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography

Applied Optics

DOI

2024

Fast and Highly Accurate Zonal Wavefront Reconstruction from Multi-Directional Slope and Curvature Information Using Subregion Cancelation

Applied Sciences

DOI

2024

Reducing noise in polarization-sensitive optical coherence tomography for high-quality local phase retardation imaging

Applied Optics

DOI

2024

Physical model-based ArF photoresist formulation development

AIP Advances

DOI

2023

嵌入式相位传感的多功能Stokes-Mueller偏振仪

《光学学报》

2023

极紫外光刻机曝光系统光学设计研究与进展

《光学学报》

2023

四波前横向剪切干涉仪的关键技术研究

《光学学报》

2023

High-fidelity source mask optimization for suppressing line-end shortening

Applied Optics

DOI

2023

Vascular imaging of in vivo human skin using a fiber-based PS-OCT system

DOI

2023

Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2023

High-accuracy reconstruction of Stokes vectors via spatially modulated polarimetry using deep learning at low light field

Applied Optics

DOI

2023

Distinguishing Malignant Melanoma and Benign Nevus of Human Skin by Retardance Using Mueller Matrix Imaging Polarimeter

Applied Sciences

DOI

2023

Implicit function characterization of the curvilinear mask to realize parametric optical proximity correction with a neighborhood parallel tabu search

Applied Optics

DOI

2023

Light propagation equation for a double Stokes-Mueller polarimetry

DOI

2023

Mueller matrix imaging polarimeter at the wavelength of 265 nm

Applied Optics

DOI

2023

The optimal measurement matrix with minimal condition number for double Stokes-Mueller polarimetry

DOI

2023

Complex Correlated Phase Gradient Variance Based Optical Coherence Tomography Angiography

IEEE photonics journal

DOI

2022

穆勒成像偏振仪在病理诊断中的可靠性研究

《光学学报》

2022

利用标量衍射理论的斜率和曲率混合型波前传感器装调技术

《光学学报》

2022

大数值孔径（NA=0.55）变倍率极紫外光刻投影物镜偏振像差高精度检测方法

《光学学报》

2022

Full field wavefront error aware source and mask optimization for extreme ultraviolet lithography

DOI

2022

Error analysis of rapid Stokes polarimetric imaging with circularly polarized illumination

Tenth International Conference on Information Optics and Photonics

DOI

2022

High noise-resistant slope and curvature signal extraction algorithm in frequency domain for the Shack-Hartmann wavefront sensor

Tenth International Conference on Information Optics and Photonics

DOI

2022

Reliability investigation of Mueller matrix imaging polarimeter in identifying cervical intraepithelial neoplasia

Tenth International Conference on Information Optics and Photonics

DOI

2022

Source optimization for anamorphic magnification high-numerical aperture extreme ultraviolet lithography based on thick mask model

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2022

Full Field Adaptive Tolerance Analysis of Extreme Ultraviolet Lithography Objective

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2022

High efficiency graded multilayer coating design using least-square fitting for NA0.55 extreme ultraviolet lithography Objective

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2022

Mask Bias optimization for NTD lithography process

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2022

Holistic and efficient calibration method for Mueller matrix imaging polarimeter with a high numerical aperture

Applied Optics

DOI

2022

Optimal design for a broadband Stokes polarimeter of liquid crystal variable retarders

Applied Optics

DOI

2022

Design of an extreme ultraviolet lithography projection objective with a grouping design method through forward and reverse real ray tracing

Applied Optics

DOI

2022

Comparative study of OCTA algorithms with a high-sensitivity multi-contrast Jones matrix OCT system for human skin imaging

Biomedical Optics Express

DOI

2022

Inverse lithography source and mask optimization via Bayesian compressive sensing

Applied Optics

DOI

2022

Design of an objective for a hyper-numerical-aperture immersion lithography tool with a multi-step alternative grouping design method

Applied Optics

DOI

2022

Hybrid wavefront reconstruction from multi-directional slope and full curvature measurements using integral equations with higher-order truncation errors for wavefront sensors

Optics and Lasers in Engineering

DOI

2022

Grouping design method dependence on an illumination system and large off-axis distance for an anamorphic extreme ultraviolet lithography objective

Applied Optics

DOI

2021

Sampling-based imaging model for fast source and mask optimization in immersion lithography

Applied Optics

DOI

2021

Polarization aberration in-situ measurement in lithography tools

DOI

2021

Lithographic exposure latitude aware source and mask optimization

DOI

2021

Contrast enhancement of polarization-sensitive optical coherence tomography skin images

DOI

2021

Comprehensive and quantitative characterization and analysis method of 3D mask effect for lithography simulation

DOI

2021

Slope and curvature detection algorithm with high noise immunity in four-hole amplitude-modulated wavefront sensor

Tenth International Conference on Information Optics and Photonics

DOI

2021

Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies

Tenth International Conference on Information Optics and Photonics

DOI

2021

Spectral calibration method for Stokes polarimeter

Tenth International Conference on Information Optics and Photonics

DOI

2021

Comparison of sparse-based full chip source optimization with different bases

Tenth International Conference on Information Optics and Photonics

DOI

2021

Application of a revised scanning splice method for the Mueller microscope

Tenth International Conference on Information Optics and Photonics

DOI

2021

Fast lithographic source pupil optimization using difference of convex functions algorithm for transformed L1 penalty

Tenth International Conference on Information Optics and Photonics

DOI

2021

Calibration of the astigmatism errors induced by misalignment of quadri-wave lateral shearing interferometer

Optical Technology and Measurement for Industrial Applications Conference (OPTM)

DOI

2021

Quality map guided parallel phase unwrapping algorithm for multi-lateral shearing interferometry

Optical Technology and Measurement for Industrial Applications Conference (OPTM)

DOI

2021

Quantitatively characterizing the microstructural features of collagen fiber bundles with or without tenocytes by Mueller imaging polarimeter

Biomedical Imaging and Sensing Conference (BISC)

DOI

2021

Study on the cellular-level polarization characteristics of pathological sections with different preparation state by Mueller matrix polarimeter

Biomedical Imaging and Sensing Conference (BISC)

DOI

2021

Fast calibration for Star test polarimetry via polarization orthogonal basis mapping

Optical Technology and Measurement for Industrial Applications Conference (OPTM)

DOI

2021

Exposure latitude aware source and mask optimization for extreme ultraviolet lithography

Applied Optics

DOI

2021

Vectorial pupil optimization to compensate for a polarization effect at full exposure field in lithography

Applied Optics

DOI

2021

High-fidelity and rapid cellular-level Mueller matrix imaging for tissue identification with unstained sections

Biomedical Optics Express

DOI

2021

Anamorphic objective design for extreme ultraviolet lithography at the 5∼1 nm technology node

Applied Optics

DOI

2021

Adaptive linear reconstruction with regularizer for channeled spectropolarimeter

Optical Engineering

DOI

2021

Rigorous imaging-based measurement method of polarization aberration in hyper-numerical aperture projection optics

Optics Express

DOI

2021

Single-shot measurement of polarization state at low light field using Mueller-mapping star test polarimetry

Optics Communications

DOI

2021

Efficient calibration method of total polarimetric errors in a channeled spectropolarimeter

Applied Optics

DOI

2021

Design of an illumination system for high numerical aperture anamorphic extreme ultraviolet projection lithography

Optics Express

DOI

2021

Multi-objective adaptive source optimization for full chip

Applied Optics

DOI

2020

深紫外光刻照明系统的微反射镜阵列公差分析

《光学学报》

2020

High-accuracy multi-step eigenvalue calibration method for Mueller matrix polarization imaging system

AOPC 2020: Optical Sensing and Imaging Technology

DOI

2020

Source Optimization under Thick Mask Model

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2020

Design of measurement and control system for dual incidence polarization high-speed Jones matrix optical coherence tomography

DOI

2020

Design and performance characterization of a quartz crystal micro-retarder array

International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems (OIT)

DOI

2020

Accuracy assessment of tissue polarimetric properties based on Mueller matrix images decomposition

International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems (OIT)

DOI

2020

Vectorial pupil optimization to compensate polarization distortion in immersion lithography system

Optics Express

DOI

2020

Hybrid calibration method of a wide-view-angle Mueller polarimeter for hyper-numerical-aperture imaging systems

Chinese Optics Letters

DOI

2019

工件台振动低敏感光刻系统协同优化方法

《红外与激光工程》

2019

高数值孔径自由曲面极紫外光刻物镜光学设计

《红外与激光工程》

2019

16 nm极紫外光刻物镜热变形对成像性能影响的研究

《光学学报》

2019

Fast lithographic source optimization method of certain contour sampling-Bayesian compressive sensing for high fidelity patterning

Optics Express

DOI

2019

Multiple-field-point pupil wavefront optimization in computational lithography

Applied Optics

DOI

2019

Fast compressed channeled spectropolarimeter for full Stokes vector measurement

DOI

2019

Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty

Applied Sciences

DOI

2019

Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field

Optics Express

DOI

2019

Co-optimization method to reduce the pattern distortion caused by polarization aberration in anamorphic EUV lithography

Applied Optics

DOI

2019

Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization

Applied Sciences

DOI

2019

Fast nonlinear compressive sensing lithographic source and mask optimization method using Newton-IHTs algorithm

Optics Express

DOI

2018

像质补偿在高分辨物镜精密装调中的应用

《光学技术》

2018

The defocused helical structure of two superposed vortex beams

DOI

2018

Split nanofocusing spots beyond diffraction limit via a new near-field plasmonic structure

DOI

2018

Self-calibration and high-accuracy detection technology for the probability density of polarization state of a light field

DOI

2018

A nonlinear measurement method of polarization aberration in immersion projection optics by spectrum analysis of aerial image

Optics Express

DOI

2018

Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography

IEEE Transactions on Computational Imaging

DOI

2018

Tolerance analysis of hyper numerical aperture lithography objective with freeform surfaces

International Conference on Optical and Photonic Engineering (icOPEN)

DOI

2018

The intensity split of tightly focusing radial and azimuthal polarized vortex beam in longitudinal direction

International Conference on Optical and Photonic Engineering (icOPEN)

DOI

2018

Design of a high-numerical-aperture extreme ultraviolet lithography illumination system

Applied Optics

DOI

2018

Fast optical proximity correction method based on nonlinear compressive sensing

Optics Express

DOI

2018

Tight focusing properties of hybrid-order Poincaré sphere beams

Optics Communications

DOI

2018

Wavefront reconstruction for multi-lateral shearing interferometry using difference Zernike polynomials fitting

Optics and Lasers in Engineering

DOI

2018

Optimization of lithography source illumination arrays using diffraction subspaces

Optics Express

DOI

2018

Determining the Charge of Vortex Beams by Focused Intensity After Polarization Modulation

IEEE Photonics Technology Letters

DOI

2018

Quantitative analysis of wide field-of-view and broadband quarter-wave plate based on metasurface

DOI

2017

组合倍率极紫外光刻物镜梯度膜设计

《光学学报》

2017

基于子孔径波前振幅调制的斜率和曲率信号提取算法

《红外与激光工程》

2017

Design of a grating by a joint optimization method for a phase-shifting point diffraction interferometer

Chinese Optics Letters

DOI

2017

Information theoretical aspects in coherent optical lithography systems

Optics Express

DOI

2017

Lithographic Source and Mask Optimization With Low Aberration Sensitivity

IEEE Transactions on Nanotechnology

DOI

2017

The calculation and representation of polarization aberration induced by 3D mask in lithography simulation

DOI

2017

Retrieve polarization aberration from image degradation: a new measurement method in DUV lithography

DOI

2017

Fast lithography aerial image calculation method based on machine learning

Applied Optics

DOI

2017

Fast lithographic source optimization using a batch-processing sequential least square estimator

Applied Optics

DOI

2017

Illumination system with freeform fly’s eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography

Optical Engineering

DOI

2017

Wavefront modulation in subapertures of zonal sensor: A new approach for hybrid slope and curvature wavefront sensing

Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)

DOI

2017

Local Slope and Curvature Tests via Wave Front Modulations in the Shack–Hartmann Sensor

IEEE Photonics Technology Letters

DOI

2017

Lithographic source optimization based on adaptive projection compressive sensing

Optics Express

DOI

2017

Grouping design method of catadioptric projection objective for deep ultraviolet lithography

Optical Engineering

DOI

2016

Mueller矩阵成像偏振仪的误差标定和补偿研究

《激光与光电子学进展》

2016

A fast and manufacture-friendly optical proximity correction based on machine learning

Microelectronic Engineering

DOI

2016

Phase extraction using multi-directional moiré fringes for multi-lateral shearing interferometry

Optics and Lasers in Engineering

DOI

2016

Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration

Optical Engineering

DOI

2016

Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method

Applied Optics

DOI

2015

90nm DUV光刻物镜重力变形及其对波像差影响分析

《光电工程》

2015

高光能利用率极紫外光刻波纹板照明系统设计

《光学学报》

2015

旋转波片法成像斯托克斯偏振仪误差标定和补偿

《中国激光》

2015

二维虚光栅移相莫尔条纹相位提取算法

《中国激光》

2015

超大数值孔径极紫外光刻物镜的公差分析

《激光与光电子学进展》

2015

Wavefront aberrations control for complex optical systems by compensation-surface

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2015

Gradient-based inverse extreme ultraviolet lithography

Applied Optics

DOI

2015

Polarization aberration control for hyper-NA lithographic projection optics at design stage

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2015

Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process

Optical Engineering

DOI

2015

Robust hybrid source and mask optimization to lithography source blur and flare

Applied Optics

DOI

2015

Clocking-optimization method for figure-error balancing in complex optical systems

Optical Engineering

DOI

2015

Gradient-based joint source polarization mask optimization for optical lithography

Journal of Micro/Nanopatterning Materials and Metrology

DOI

2015

A fast and flexible library-based thick-mask near-field calculation method

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2015

Design of three-mirror illumination system with free-form fly’s eye for extreme ultraviolet lithography

Applied Optics

DOI

2015

Wide dynamic range wavefront sensor using sub-wavelength grating array

Optics Communications

DOI

2014

嵌入式光栅多层结构锥形衍射的严格耦合波理论研究

《红外与激光工程》

2014

投影光刻物镜波像差的公差分析方法

《光学技术》

2014

Parametric source-mask-numerical aperture co-optimization for immersion lithography

Journal of Micro/Nanopatterning Materials and Metrology

DOI

2014

Design of chirped fly’s eye uniformizer for ArF lithography illumination system

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Design of freeform illumination sources with arbitrary polarization for immersion lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Fast pixel-based optical proximity correction based on nonparametric kernel regression

Journal of Micro/Nanopatterning Materials and Metrology

DOI

2014

Inverse pupil wavefront optimization for immersion lithography

Applied Optics

DOI

2014

Initial structure design of coaxial six–ten mirror central-obscured extreme ultraviolet lithographic objective

Applied Optics

DOI

2014

Optimized imaging polarimeter for measuring polarization properties of hyper number aperture lithography tools

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Hybrid approach for the design of mirror array to produce freeform illumination sources in immersion lithography

Optik

DOI

2014

Designing projection objectives for 11-nm node of extreme ultraviolet lithography

Journal of Micro/Nanopatterning Materials and Metrology

DOI

2014

A method for compensating the polarization aberration of projection optics in immersion lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Measuring the polarization aberration of hyper-NA lens from the vector aerial image

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Inverse lithography source optimization via compressive sensing

Optics Express

DOI

2014

Misalignment effects of cross-phase grating lateral shearing interferometer and its alignment technique

Optical Engineering

DOI

2014

Measurement of lens aberration based on vector imaging theory

Optical Review

DOI

2014

Designing extreme-ultraviolet lithographic objective for 11 nm node

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Efficient source polarization optimization for robust optical lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2014

Co-optimization of the mask, process, and lithography-tool parameters to extend the process window

Journal of Micro/Nanopatterning Materials and Metrology

DOI

2014

Automatic figure errors balancing method for catoptric and catadioptric lenses

Optical Engineering

DOI

2013

高阶截断误差的斜率和曲率混合型波前重构算法

《光学技术》

2013

宽视场角1/4波片装调和加工误差对偏振检测的影响

《光学学报》

2013

超高数值孔径Schwarzschild投影光刻物镜的光学设计

《光学学报》

2013

波片对斜入射光波产生相位延迟的两种计算方法

《光学技术》

2013

掩模衍射频谱轴向分量对光刻成像性能的影响

《光学学报》

2013

16～22nm极紫外光刻物镜工程化设计

《光学学报》

2013

模拟光刻中双层衰减相移接触孔衍射的理论公式

《光学技术》

2013

相移点衍射干涉仪用衍射板结构设计

《激光与光电子学进展》

2013

A technique for extracting and analyzing the polarization aberration of hyper-numerical aperture image optics

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2013

Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2013

The application of variable universe fuzzy PID controller in computer-aided alignment of lithography projector

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2013

Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective

Optical Engineering

DOI

2013

Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography

Applied Optics

DOI

2013

Approach to characterize manufacture tolerances of two-dimensional cross-phase grating

Optical Engineering

DOI

2013

Polarization effects induced by the bi-layer attenuated phase-shift mask and their impacts on near-field distribution

Optik

DOI

2013

Improving wavefront reconstruction accuracy by using integration equations with higher-order truncation errors in the Southwell geometry

Journal of the Optical Society of America A

DOI

2013

Hybrid source mask optimization for robust immersion lithography

Applied Optics

DOI

2013

Block-based mask optimization for optical lithography

Applied Optics

DOI

2013

A reverse design method for EUV lithography illumination system

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2013

Simulation of the polarization effects induced by the bilayer absorber alternating phase-shift mask in conical diffraction

Optical Engineering

DOI

2013

Design of multi-mirror optics for industrial extreme ultraviolet lithography

Optical Review

DOI

2012

22nm极紫外光刻物镜热和结构变形及其对成像性能影响

《光学学报》

2012

Two-dimensional interferogram extrapolation method using linear carrier-frequency

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Influence of flare and NA error on lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Impact of MSD and mask manufacture errors on 45nm-node lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Mask optimization approaches in optical lithography based on a vector imaging model

Journal of the Optical Society of America A

DOI

2012

Analysis and control of thermal and structural deformation of projection optics for 22-nm EUV lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Gradient-based resolution enhancement optimization methods based on vector imaging model

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Three-dimensional polarization aberration in hyper-numerical aperture lithography optics

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Robust resolution enhancement optimization methods to process variations based on vector imaging model

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Impact of non-uniform polarized illumination on hyper-NA lithography

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Analysis and optimization approaches for wide-viewing-angle λ/4 plate in polarimetry for immersion lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI

2012

Pixelated source and mask optimization for immersion lithography

Journal of the Optical Society of America A

DOI

2012

Detailed illuminator design for full-field ArF lithography system with a method based on the fly's eye

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Improved wavefront reconstruction using difference Zernike polynomials for two double-shearing wavefronts

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

High numerical aperture Hartmann wavefront sensor with pinhole array extended source

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Vectorial mask optimization methods for robust optical lithography

Journal of Micro/Nanopatterning Materials and Metrology

DOI

2012

Illuminator design for small field ArF lithography system

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

The cross talk of multi-errors impact on lithography performance and the method of its control

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2012

Simulation of sub-wavelength 3D photomask induced polarization effect by RCWA

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2011

超大数值孔径光刻中掩模保护膜优化及偏振像差研究

《中国激光》

2011

大数值孔径产业化极紫外投影光刻物镜设计

《光学学报》

2011

Comparison of wavefront reconstruction with modal method and zonal method for the inspection of catadioptric projection optics using Hartmann wavefront sensor

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2011

Optimal 3D phase-shifting masks in partially coherent illumination

Applied Optics

DOI

2011

Calibration method to characterize the accuracy of phase-shifting point diffraction interferometer

Review of Scientific Instruments

DOI

2010

相移点衍射干涉仪的关键技术研究

《激光与光电子学进展》

2010

含中心遮拦剪切干涉图的波前重建新方法

《光学技术》

2010

一种新的相移点衍射干涉仪系统误差标定方法

《光学学报》

2010

一种新的基于线性载波延拓的相位展开方法

《光学学报》

2010

相移点衍射干涉仪的高精度对准

《中国激光》

2009

李艳秋 著名先进光学制造技术专家

《航空制造技术》

2009

移相干涉术中有分割遮拦干涉图的相位展开

《光学学报》

2009

Development of a 20X Schwarzschild projection optics for principle experiment of EUV at-wavelength interferometry

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2008

含噪声包裹相位图的加权最小二乘相位展开算法研究

《光学技术》

2008

高数值孔径光刻成像中顶层抗反膜的优化

《光学学报》

2008

高数值孔径光刻成像中双层底层抗反膜的优化

《光学学报》

2008

高数值孔径光学光刻成像中的体效应

《光学学报》

2008

Computer aided alignment of 20X Schwarzschild projection optics

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2008

Design optimization of phase-shifting point diffraction interferometer

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2008

Optimization of resolution-enhancement technology and dual-layer bottom-antireflective coatings in hypernumerical aperture lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI

2008

Potential of phase-shifted optical proximity correction for 65nm T-shaped pattern in high numerical aperture lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI

2007

分辨力增强技术的频谱分析

《光学学报》

2007

移相式点衍射干涉仪的几个关键技术

《仪器仪表学报》

2007

一种新的质量图导引路径积分相位展开算法

《光电工程》

2007

Impact of source polarization on the imaging of line and space features at 45nm half pitch node

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2007

Interferogram region extrapolation technology by exemplar-based image inpainting

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2007

Impact of molybdenum/silicon multilayer structure on extreme ultraviolet mask fabrication

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2007

Transient Thermal and Structural Deformation and Its Impact on Optical Performance of Projection Optics for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics

DOI

2007

The application of partial differential equation in interferogram denoising

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI

2007

Pattern Density Dependence of Thermal Deformation of Extreme Ultraviolet Mask and Its Impact on Full Field Lithography Performance

Japanese Journal of Applied Physics

DOI

2007

Effect of Resolution Enhancement Techniques on Aberration Sensitivities of ArF Immersion Lithography at 45 nm Node

Japanese Journal of Applied Physics

DOI

2006

EUV光刻中激光等离子体光源的发展

《微细加工技术》

2004

50nm分辨力极端紫外光刻物镜光学性能研究

《光学学报》