李思坤

2026

基于生成对抗式神经网络的全息光刻掩模快速设计方法

《光学学报》

2026

Simulation of EUV mask defect classification based on optical neural network

Optical Systems Design

DOI

2026

Three-dimensional absorber correction for EUV mask defect compensation.

Optics Express

DOI

2026

Vector Diffraction Modeling and Parametric Study of 266 nm Sub-wavelength Pinholes for High-NA Wavefront Sensing

Applied Optics

DOI

2026

Top-profile-prior-constrained inversion for bottom-parameter reconstruction of extreme ultraviolet mask phase defects.

Applied Optics

DOI

2026

Normal-height ambiguity elimination with reflection law in fringe-reflection stereo deflectometry

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)

DOI

2025

自由光瞳整形模块中的消相干微透镜阵列设计方法

Chinese Journal of Lasers

DOI

2025

High-efficiency EUV mask defect compensation method based on the pixelated absorber layer correction.

Optics Express

DOI

2025

Real-time Shack-Hartmann wavefront processor with FPGA acceleration

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2025

Proximity lithography simulation: from shadow printing to holographic lithography

DOI

2024

全息光刻技术（特邀）

《中国激光》

2024

导向自组装光刻仿真技术

《中国激光》

2024

Random Phase Plate Designed by Genetic Algorithm for Decoherence in Energy Homogenization Units of Photolithography Illumination System

Applied Optics

DOI

2024

TransUNet-based end-to-end proximity effect correction for electron beam lithography

International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2023

基于预训练VGG11模型的光刻坏点检测方法

Acta Optica Sinica

DOI

2023

极紫外光刻掩模相位型缺陷检测方法

Acta Optica Sinica

DOI

2023

基于空间像主成分分析的光刻投影物镜波像差检测技术

《光学学报》

2023

Improving accuracy and sensitivity of diffraction-based overlay metrology

Chinese Optics Letters (COL)

DOI

2023

Multilayer defect compensation based on three dimensional absorber correction in EUV lithography

Other Conferences

DOI

2023

Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography.

Applied Optics

DOI

2023

Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images

Other Conferences

DOI

2023

Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools.

Applied Optics

DOI

2023

An Optimization Method To Improve Accuracy of the Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Images

2023 International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2023

Effects and elimination of image grating defocusing on a double-Ronchi shearing interference field.

Applied Optics

DOI

2022

基于深度优先搜索的全芯片光源掩模优化关键图形筛选方法

Acta Optica Sinica

DOI

2022

EUV光刻三维掩模成像研究进展

Laser & Optoelectronics Progress

DOI

2022

光源掩模联合优化技术研究

Laser & Optoelectronics Progress

DOI

2022

芯片制造语境下的计算光刻技术

《激光与光电子学进展》

2022

深紫外计算光刻技术研究

《激光与光电子学进展》

2022

极紫外光刻快速掩模优化方法

Acta Optica Sinica

DOI

2022

极紫外光刻掩模缺陷检测与补偿技术研究

Laser & Optoelectronics Progress

DOI

2022

偏振相移点衍射干涉波像差检测技术研究

《中国激光》

2022

Through-focus EUV multilayer defect compensation considering optical proximity correction.

Applied Optics

DOI

2022

A Generation solving Layout Decomposition Method for DSA-MP Hybrid Lithography

2022 International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2022

A Via/Contact Layout Decomposition Method for Directed Self-Assembly Based on Local Optimization

2022 International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2022

Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field.

Applied Optics

DOI

2022

Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network

Applied Sciences

DOI

2021

Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling.

Optics Express

DOI

2021

A fast mask diffraction model towards rigorous simulation in terms of accuracy

2021 International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2021

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm.

Optics Express

DOI

2021

Design and analysis of bilayer metallic grating polarizer in deep ultraviolet band

Acta Physica Sinica

DOI

2021

A Scanner Matching Method based on Interior-point BFGS Algorithm

2021 International Workshop on Advanced Patterning Solutions (IWAPS)

DOI

2021

Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images.

Applied Optics

DOI

2021

A scanner matching method based on covariance matrix adaptation evolution strategy

Other Conferences

DOI

2021

Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall.

Applied Optics

DOI

2021

Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling.

Optics Express

DOI

2020

基于光刻胶三维形貌的光刻多参数联合优化方法

《光学学报》

2020

极紫外光刻掩模相位型缺陷的形貌重建方法

《光学学报》

2020

基于衍射谱分析的全芯片光源掩模联合优化关键图形筛选

《光学学报》

2020

Critical pattern selection method for full-chip source and mask optimization.

Optics Express

DOI

2020

Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

DOI

2020

Fast rigorous mask model for extreme ultraviolet lithography.

Applied Optics

DOI

2020

Micromirror array allocation algorithm based on deconvolution.

Applied Optics

DOI

2020

Large-scale structured light 3D shape measurement with reverse photography

DOI

2020

Source mask optimization using the covariance matrix adaptation evolution strategy.

Optics Express

DOI

2020

Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

DOI

2020

Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

DOI

2019

光刻投影物镜的琼斯光瞳检测方法

《光学学报》

2019

基于差分进化算法的光刻机匹配方法

《光学学报》

2019

基于差分空间像主成分分析的偏振像差检测方法

《光学学报》

2019

穆勒矩阵成像椭偏仪误差源的简化分析方法

《光学学报》

2019

High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix

Optics Communications

DOI

2019

Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask

DOI

2019

Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

DOI

2019

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)

Journal of Edugeography

DOI

2019

Predictor of thermal aberrations via particle filter for online compensation

Journal of Edugeography

DOI

2019

Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter

DOI

2019

Fast thermal aberration model for lithographic projection lenses.

Optics Express

DOI

2019

Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources.

Optics Express

DOI

2018

基于机器学习校正的极紫外光刻含缺陷掩模仿真方法

《光学学报》

2018

基于多偏振照明的浸没式光刻机投影物镜高阶波像差快速检测技术

《光学学报》

2018

基于改进型结构分解的极紫外光刻掩模衍射谱快速仿真方法

《光学学报》

2018

3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration

DOI

2018

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy

Journal of Edugeography

DOI

2018

Towards gamma-effect elimination in phase measurement profilometry

Optik (Stuttgart)

DOI

2018

Digital sinusoidal fringe generation with defocusing for profilometry: exponential binary vs squared binary patterns

SPIE/COS Photonics Asia

DOI

2018

Optical fringe-reflection deflectometry with bundle adjustment

Optics and lasers in engineering

DOI

2018

High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

DOI

2018

Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology

DOI

2018

Modeling and optimization of lens heating effect for lithographic projector

DOI

2018

Sparse and adaptive fringe-enhancement efficiency analysis in 3D optical digital fringe-projection imaging

International Conference on Digital Image Processing

DOI

2018

Prediction of lens heating induced aberration via particle filter in optical lithography

Advanced Lithography

DOI

2017

基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法

《光学学报》

2017

基于变量分离分解法的极紫外光刻三维掩模快速仿真方法

《光学学报》

2017

超高NA光刻投影物镜高阶波像差检测方法

《光学学报》

2017

反向摄影大尺度空间结构光三维测量

《影像科学与光化学》

2017

High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens

DOI

2017

Fast Simulation Method of Extreme-Ultraviolet Lithography 3D Mask Based on Variable Separation Degration Method

DOI

2017

Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

DOI

2017

The thermal aberration analysis of a lithography projection lens

Advanced Lithography

DOI

2017

Optical fringe-reflection deflectometry with sparse representation

DOI

2017

Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry.

Applied Optics

DOI

2016

基于评价函数的二维小波变换轮廓术小波脊提取方法

《光学学报》

2016

基于动态适应度函数的光源掩模优化方法

《光学学报》

2016

基于交替相移掩模矢量空间像的偏振像差检测方法

《光学学报》

2016

基于多染色体遗传算法的像素化光源掩模优化方法

《光学学报》

2016

超大数值孔径光刻机投影物镜波像差检测方法

《光学学报》

2016

Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image.

Applied Optics

DOI

2016

Aberration Measurement Method for Hyper-NA Lithographic Projection Lens

DOI

2016

Pixelated source optimization for optical lithography via particle swarm optimization

DOI

2016

Wavelet Ridge Extraction Method Employing a Cost Function in Two- Dimensional Wavelet Transform Profilometry

DOI

2016

Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry.

Applied Optics

DOI

2016

Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm

DOI

2016

Source Mask Optimization Based on Dynamic Fitness Function

DOI

2016

Radial period extraction method employing frequency measurement for quantitative collimation testing

DOI

2016

Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography

Advanced Lithography

DOI

2016

General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination.

Journal of The Optical Society of America A-optics Image Science and Vision

DOI

2015

极紫外光刻含缺陷掩模仿真模型及缺陷的补偿

《光学学报》

2015

投影物镜偏振像差对光刻成像质量影响的解析分析方法

《光学学报》

2015

Ronchi剪切干涉光刻投影物镜波像差检测技术研究

《中国激光》

2015

基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型

《光学学报》

2015

基于粒子群优化算法的光刻机光源优化方法

《光学学报》

2015

Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging

DOI

2015

Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Advanced Lithography

DOI

2015

Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography

DOI

2015

Study on Ronchi Shearing Interferometry for Wave-Front Aberration Measurement of Lithography Projection Lens

DOI

2015

Wavefront reconstruction for lateral shearing interferometry based on difference polynomial fitting

DOI

2015

Source optimization using particle swarm optimization algorithm in photolithography

Advanced Lithography

DOI

2014

极紫外光刻含缺陷多层膜衍射谱仿真简化模型

《光学学报》

2014

基于并行小波变换的快速三维面形测量技术

《光学学报》

2014

基于相位环空间像主成分分析的投影物镜波像差检测方法

《光学学报》

2014

基于随机并行梯度速降算法的光刻机光源与掩模联合优化方法

《光学学报》

2014

基于二次规划的光刻机光源优化方法

《光学学报》

2014

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Advanced Lithography

DOI

2014

Source Optimization Method of Lithography Tools Based on Quadratic Programming

DOI

2014

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

DOI

2014

Efficient source mask optimization using multipole source representation

DOI

2014

A method for joint optimization of the mask aligner light source

2014

In situ aberration measurement method using a phase-shift ring mask

DOI

2014

The optical fringe phase extraction method based wavelet transform parallel computing gpu

2014

Aberration measurement based on principal component analysis of aerial images of optimized marks

DOI

2014

Aberration measurement technique based on an analytical linear model of a through-focus aerial image.

Optics Express

DOI

2014

Detection method of wave aberration and optical imaging focal plane of photoetching projection objective

2014

Light source optimization method of photolithography machine

2014

Source and Mask Optimization Using Stochastic Parallel Gradient Descent Algorithm in Optical Lithography

DOI

2014

A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask

Advanced Lithography

DOI

2014

In Situ Aberration Measurement Method Based on a Phase-Shift Rings Target

DOI

2014

Fast Three-Dimensional Shape Measurement Technique by Means of Wavelet Transform Based on Parallel Computing

DOI

2014

Simplified Model for Defective Multilayer Diffraction Spectrum Simulation in Extreme Ultraviolet Lithography

DOI

2013

基于单光弹调制器的米勒矩阵测量技术

《光学学报》

2013

基于单光弹调制器的米勒矩阵测量误差分析

《光学学报》

2013

基于空间像自适应降噪的投影物镜波像差检测方法

《光学学报》

2013

Projection Lens Wave-Front Aberration Measurement Method Based on Adaptive Aerial Image Denoising

DOI

2013

Adaptive denoising method to improve aberration measurement performance

DOI

2013

Extended AMAI-PCA technique based on multi-level Box–Behnken design

DOI

2013

In situ aberration measurement technique based on an aerial image with an optimized source

DOI

2013

Defect parameters retrieval based on optical projection images

Optical Metrology

DOI

2013

Source mask optimization using real-coded genetic algorithms

Advanced Lithography

DOI

2013

Projection objective wave aberration detection method based on phase ring space image principle component analysis

2013

Three-dimensional information security combined fringe projection with double random phase encoding

DOI

2013

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

DOI

2013

Robust pixel-based source and mask optimization for inverse lithography

DOI

2012

Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern analysis.

Applied Optics

DOI

2012

Hilbert assisted wavelet transform method of optical fringe pattern phase reconstruction for optical profilometry and interferometry

DOI

2012

Symmetric polarization aberration compensation method based on scalar aberration control for lithographic projection lens

Advanced Lithography

DOI

2012

In situ aberration measurement technique based on aerial image with optimized source

Optical Systems Design

DOI

2012

Analytical approach to the impact of polarization aberration on lithographic imaging.

Optics Letters

DOI

2012

In situ aberration measurement technique based on quadratic Zernike model

Optical Systems Design

DOI

2012

The overlay performance optimization based on overlay manager system

Advanced Lithography

DOI

2011

基于解析图像的小波变换光学载频干涉全息图相位重建方法

《中国激光》

2011

A new wavelet transform for reliability-guided phase unwrapping of optical fringe patterns

DOI

2011

Analysis on fringe pattern demodulation by use of 2-D CWT

DOI

2011

Analytic Image Based Wavelet Transform Method for Phase Reconstruction of Optical Interferogram with Linear-Carrier

DOI

2011

Key rotation multiplexing for multiple-image optical encryption in the Fresnel domain

DOI

2010

二维实小波变换在空间载频条纹相位分析中的应用

《光学学报》

2010

二维小波变换在解调双载频条纹图中的应用

《激光与光电子学进展》

2010

Wavelet ridge techniques in optical fringe pattern analysis.

Journal of The Optical Society of America A-optics Image Science and Vision

DOI

2010

Universal calculation formula and calibration method in Fourier transform profilometry.

Applied Optics

DOI

2010

Applications of Two-Dimensional Wavelet Transform on Phase Analysis of Spatial Carrier-Fringe Patterns

DOI

2009

傅里叶变换轮廓术中基于经验模态分解抑制零频的方法

《光学学报》

2009

小波变换在三维面形测量中的最佳小波的选择

《光电子·激光》

DOI

2009

Spatial carrier fringe pattern phase demodulation by use of a two-dimensional real wavelet.

Applied Optics

DOI

2009

Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decomposition.

Journal of The Optical Society of America A-optics Image Science and Vision

DOI

2009

Empirical Mode-Decomposition Method for Eliminating Extention of Zero Component in Fourier Transform Profilometry

DOI

2008

小波变换轮廓术中用小波脊系数幅值引导相位展开的研究

《光学学报》

2008

Reliability-guided phase unwrapping in wavelet-transform profilometry.

Applied Optics

DOI

2018

基于机器学习参数校正的极紫外光刻三维含缺陷掩模仿真方法

《第十七届全国光学测试学术交流会》

2018

基于微反射镜阵列的光刻照明系统快速配置方法

《第十七届全国光学测试学术交流会摘要集》

2018

一种直接测量琼斯光瞳的光刻投影物镜偏振像差检测方法

《第十七届全国光学测试学术交流会摘要集》

2018

基于空间像的极紫外光刻掩模相位型缺陷形貌检测方法

《第十七届全国光学测试学术交流会摘要集》

2018

基于遗传算法的光刻机性能匹配方法

《第十七届全国光学测试学术交流会摘要集》

2018

一种基于参数标定的三维光刻胶模型

《第十七届全国光学测试学术交流会摘要集》

2018

光刻掩模图形筛选技术研究

《第十七届全国光学测试学术交流会摘要集》

2018

Enhanced projection range with defocusing for fringe projection profilometry

《第十七届全国光学测试学术交流会摘要集》

2016

高NA光刻投影物镜高阶波像差检测方法

《第十六届全国光学测试学术交流会摘要集》

2016

光刻投影物镜热像差分析方法

《第十六届全国光学测试学术交流会》

2016

采用空间像降维的光刻投影物镜偏振像差原位检测方法

《第十六届全国光学测试学术交流会》

2016

基于分离变量法的极紫外光刻三维掩模快速仿真方法

《第十六届全国光学测试学术交流会》

2016

基于线性规划的光刻机光源优化方法

《第十六届全国光学测试学术交流会》

2016

Optimal Defocus Selection for Squared Binary Defocusing in Digital Fringe Projection Profilometry

《第十六届全国光学测试学术交流会》

2014

基于严格电磁场仿真的光刻机光源优化方法

《第十五届全国光学测试学术交流会论文摘要集》

2014

基于动态适应度函数的光刻机光源掩模优化方法

《第十五届全国光学测试学术交流会论文摘要集》

2014

基于空间像主成分分析的光刻投影物镜波像差和成像最佳焦面检测方法

《第十五届全国光学测试学术交流会论文摘要集》

2014

投影物镜偏振像差对光刻成像质量的影响分析

《第十五届全国光学测试学术交流会论文摘要集》

2014

基于小波变换和双螺旋莫尔条纹的光束准直性检测方法

《第十五届全国光学测试学术交流会论文摘要集》

2014

基于等效膜层法的含缺陷多层膜衍射谱快速仿真方法

《第十五届全国光学测试学术交流会论文摘要集》

2012

基于单光弹调制器的米勒矩阵测量方法

《第十四届全国光学测试学术讨论会》

2012

基于浮点数编码遗传算法的光源掩模优化方法

《第十四届全国光学测试学术讨论会论文（摘要集）》