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Zhaohao Zhang, Fan Zhang, Yadong Zhang, Gaobo Xu, Zhenhua Wu, Qingzhu Zhang, Yongliang Li, Huaxiang Yin, Jun Luo, Wenwu Wang, Tianchun Ye (2022). Ultradense One-Memristor Ternary-Content-Addressable Memory Based on Ferroelectric Diodes. IEEE Electron Device Letters.DOI
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Yong Du, Wenqi Wei, Buqing Xu, Guilei Wang, Ben Li, Yuanhao Miao, Xuewei Zhao, Zhenzhen Kong, Hongxiao Lin, Jiahan Yu, Jiale Su, Yan Dong, Wenwu Wang, Tianchun Ye, Jianjun Zhang, Henry H. Radamson (2022). Reduced Dislocation of GaAs Layer Grown on Ge-Buffered Si (001) Substrate Using Dislocation Filter Layers for an O-Band InAs/GaAs Quantum Dot Narrow-Ridge Laser. Micromachines.DOI
Haoyan Liu, Yongliang Li, Xiaohong Cheng, Chun Li, Jiayi Zhang, Jun Luo, Wenwu Wang, Tianchun Ye (2022). A stacked high-Ge-concentration SiGe/Ge multilayer on a novel Ge + SiGe SRB structure for the gate-all-around MOSFETS. Journal of Materials Science Materials in Electronics.DOI
Junshuai Chai, Hao Xu, Jinjuan Xiang, Yuanyuan Zhang, Lixing Zhou, Shujing Zhao, Fengbin Tian, Jiahui Duan, Kai Han, Xiaolei Wang, Jun Luo, Wenwu Wang, Tianchun Ye, Yuzheng Guo (2022). First-principles study of oxygen vacancy defects in orthorhombic Hf0.5Zr0.5O2/SiO2/Si gate stack. Journal of Applied Physics.DOI
Xiaolei Yu, Jing He, Qianhui Li, Bo Zhang, Xianliang Wang, Yang Liu, Tianchun Ye, Qi Wang, Zongliang Huo (2022). LIAD: A Method for Extending the Effective Time of 3-D TLC NAND Flash Hard Decision. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.DOI
Buqing Xu, Guilei Wang, Yong Du, Yuanhao Miao, Ben Li, Xuewei Zhao, Hongxiao Lin, Jiahan Yu, Jiale Su, Yan Dong, Tianchun Ye, Henry H. Radamson (2022). Monolithic Integration of O-Band InAs Quantum Dot Lasers with Engineered GaAs Virtual Substrate Based on Silicon. Nanomaterials.DOI
Pengzhan Liu, Zhongmao Li, Wen Biao Fu, Junjian Yin, Xin Qiu, Tianchun Ye (2022). Complementary Split-Ring Resonators in Microwave Filters: A Review and Focus on Structural Progress. IEEE Microwave Magazine.DOI
Zhenfang Xiao, Qiuhong Wang, Huilong Zhu, Zuyan Chen, Yongkui Zhang, J. J. Li, N. Zhou, Jianfeng Gao, X. Z. Ai, S. S. Lu, Weixing Huang, Wenjuan Xiong, Zhenzhen Kong, Jinjuan Xiang, Yongzheng Zhang, Jianwen Zhao, Junbiao Liu, Yihong Lu, G. B. Bai, Xiaobin He, Anyan Du, Zhenhua Wu, Tao Yang, J. F. Li, Jun Luo, W. W. Wang, Tianchun Ye (2022). Vertical C-Shaped-Channel Nanosheet FETs Featured With Precise Control of Both Channel-Thickness and Gate-Length. IEEE Electron Device Letters.DOI
Xuebing Zhou, Jing Xu, Gao Jianfeng, Jinbiao Liu, Dan Zhang, Yaodong Liu, Xianglie Sun, Mengjuan Kong, Yongliang Li, Junfeng Li, Wenwu Wang, Tianchun Ye, Jun Luo (2022). Time-dependent dielectric breakdown (TDDB) for Co0.65Ti0.35 as a single barrier/liner in local Co interconnects. Journal of Materials Science Materials in Electronics.DOI
Jian Chang Yuan, Huilin An, Jun Li, Chenglin Yang, Liqiang Cao, Tianchun Ye (2022). Decoupling Analysis of Structural Parameters in the Robust Design of Metamaterial Absorber. IEEE Transactions on Electromagnetic Compatibility.DOI
Yaodong Liu, Xianglie Sun, Jing Xu, Jianfeng Gao, Jinbiao Liu, Xuebing Zhou, Yongliang Li, Junfeng Li, Wenwu Wang, Tianchun Ye, Jun Luo (2022). Insertion of Hafnium Interlayer to Improve the Thermal Stability of Ultrathin TiSi x in TiSi x /n+-Si Ohmic Contacts. IEEE Transactions on Electron Devices.DOI
Jiahui Duan, Hao Xu, Shujing Zhao, Fengbin Tian, Jinjuan Xiang, Kai Han, Tingting Li, Xiaolei Wang, Wenwu Wang, Tianchun Ye (2022). Impact of mobility degradation on endurance fatigue of FeFET with TiN/Hf0.5Zr0.5O2/SiOx/Si (MFIS) gate structure. Journal of Applied Physics.DOI
Caiping Wan, Yuanhao Zhang, Wenhao Lu, Niannian Ge, Tianchun Ye, Hengyu Xu (2022). Improving the reliability of MOS capacitor on 4H-SiC (0001) with phosphorus diffused polysilicon gate. Semiconductor Science and Technology.DOI
Liang Li, Chao Chen, Hui Zeng, Shiyi Hu, Libin Zhang, Yajuan Su, Yayi Wei, Tianchun Ye, Yun Wang, Jing Xue (2022). Analysis of diffraction-based wafer alignment rejection for thick aluminum process. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.DOI
Yang Huang, Zhengsheng Han, Fanyu Liu, Bo Li, Binhong Li, Jiantou Gao, Gang Zhang, Lei Wang, Duoli Li, Jian Jiao, Fazhan Zhao, Tianchun Ye (2022). Total Ionizing Dose Radiation Effects Hardening Using Back-Gate Bias in Double-SOI Structure. IEEE Transactions on Nuclear Science.DOI
Shujing Zhao, Fengbin Tian, Hao Xu, Jinjuan Xiang, Tingting Li, Junshuai Chai, Jiahui Duan, Kai Han, Xiaolei Wang, Wenwu Wang, Tianchun Ye (2022). Experimental Extraction and Simulation of Charge Trapping During Endurance of FeFET With TiN/HfZrO/SiO2/Si (MFIS) Gate Structure. IEEE Transactions on Electron Devices.DOI
Haitao Zhang, Xuanwu Kang, Ying-Kui Zheng, K. Wei, Hao Wu, Xinyu Liu, Tianchun Ye, Zhi Jin (2022). Investigation on Capacitance Collapse Induced by Secondary Capture of Acceptor Traps in AlGaN/GaN Lateral Schottky Barrier Diode. Micromachines.DOI
Dan Zhang, Chao Zhao, Jing Xu, Jianfeng Gao, Jinbiao Liu, Yaodong Liu, Menghua Li, Xuebing Zhou, Xianglie Sun, Yongliang Li, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2021). A Novel Method to Reduce Specific Contact Resistivity of TiSix/n+-Si Contacts by Employing an In-Situ Steam Generation Oxidation Prior to Ti Silicidation. IEEE Electron Device Letters.DOI
Zhongmao Li, Pengzhan Liu, Wen Fu, Xin Qiu, Tianchun Ye (2021). Planar Gradient-Meander Line Microwave Inductor and Designing a 10-MHz–67-GHz Stopband Inductor for Ultrawideband Applications. IEEE Transactions on Electron Devices.DOI
Dan Zhang, Chaochao Fu, Jing Xu, Chao Zhao, Jianfeng Gao, Yaodong Liu, Menghua Li, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Dongping Wu, Jun Luo (2021). NiSi/p⁺-Si(n⁺-Si)/n-Si(p-Si) Diodes With Dopant Segregation (DS): p-n or Schottky Junctions? IEEE Transactions on Electron Devices.DOI
Wenhao Lu, Caiping Wan, Xizi Zhang, Yujie Du, Niannian Ge, Hengyu Xu, Tianchun Ye (2021). The Influence to Uniform Current Distribution of SiC MOSFET Modules Based on the 3rd Quadrant Characteristics. IOP Conference Series Earth and Environmental Science.DOI
Yongkui Zhang, Xuezheng Ai, Xiaogen Yin, Huilong Zhu, Hong Yang, Guoxiang Wang, J. J. Li, Anyan Du, Chen Li, Weixing Huang, Lu Xie, Yangyang Li, Yangbo Liu, Y. B. Zhang, K. P. Jia, Zhenhua Wu, Xueli Ma, Qingzhu Zhang, Shujuan Mao, Gaobo Xu, Jinjuan Xiang, Jianfeng Gao, Xiaobin He, Yihong Lu, G. B. Bai, Jianwen Zhao, Yongliang Li, Tao Yang, J. F. Li, Huaxiang Yin, Henry H. Radamson, Jun Luo, Chao Zhao, W. W. Wang, Tianchun Ye (2021). Vertical Sandwich GAA FETs With Self-Aligned High-k Metal Gate Made by Quasi Atomic Layer Etching Process. IEEE Transactions on Electron Devices.DOI
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Tianyang Gai, Tong Qu, Xiaojing Su, Shuhan Wang, Lisong Dong, Libin Zhang, Rui Chen, Yajuan Su, Yayi Wei, Tianchun Ye (2021). Multi-level layout hotspot detection based on multi-classification with deep learning.DOI
Jie Gu, Qingzhu Zhang, Zhenhua Wu, Jiaxin Yao, Zhaohao Zhang, Xiaohui Zhu, Guilei Wang, Junjie Li, Yongkui Zhang, Yuwei Cai, Renren Xu, Gaobo Xu, Qiuxia Xu, Huaxiang Yin, Jun Luo, Wenwu Wang, Tianchun Ye (2021). Cryogenic Transport Characteristics of P-Type Gate-All-Around Silicon Nanowire MOSFETs. Nanomaterials.DOI
Tianyang Gai, Tong Qu, Shuhan Wang, Xiaojing Su, Renren Xu, Yun Wang, Jing Xue, Yajuan Su, Yayi Wei, Tianchun Ye (2021). Flexible Hotspot Detection Based on Fully Convolutional Network With Transfer Learning. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.DOI
Dan Zhang, Xiaojing Su, Hao Chin Chang, Hao Xu, Xiaolei Wang, Xiaobin He, Junjie Li, Fei Zhao, Qide Yao, Yanna Luo, Xueli Ma, Hong Yang, Yongliang Li, Zhenhua Wu, SU Ya-juan, Tao Yang, Yayi Wei, Anyan Du, Huilong Zhu, Junfeng Li, Huaxiang Yin, Jun Luo, Tianchun Ye, Wenwu Wang (2021). Advanced process and electron device technology. Tsinghua Science & Technology.DOI
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Fengbin Tian, Shujing Zhao, Hao Xu, Jinjuan Xiang, Tingting Li, Wenjuan Xiong, Jiahui Duan, Junshuai Chai, Kai Han, Xiaolei Wang, Wenwu Wang, Tianchun Ye (2021). Impact of Interlayer and Ferroelectric Materials on Charge Trapping During Endurance Fatigue of FeFET With TiN/Hf x Zr1-x O2/Interlayer/Si (MFIS) Gate Structure. IEEE Transactions on Electron Devices.DOI
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Xiaoqing Sun, Yuanyuan Zhang, Jinjuan Xiang, Kai Han, Xiaolei Wang, Wenwu Wang, Tianchun Ye (2021). The Effect of Interface Traps at the Si/SiO₂ Interface on the Transient Negative Capacitance of Ferroelectric FETs. IEEE Transactions on Electron Devices.DOI
Yuanyuan Zhang, Xiaoqing Sun, Junshuai Chai, Hao Xu, Xueli Ma, Jinjuan Xiang, Kai Han, Xiaolei Wang, Wenwu Wang, Tianchun Ye (2021). Thermodynamic driving force of transient negative capacitance of ferroelectric capacitors. Applied Physics Letters.DOI
Weikang Wan, Mei Xue, Liqiang Cao, Tianchun Ye, Qidong Wang (2021). Low‐profile compact metasurface‐loaded patch antenna with enhanced bandwidth. Microwave and Optical Technology Letters.DOI
Weikang Wan, Yuxiang Zheng, Liqiang Cao, Tianchun Ye, Qi-Dong Wang (2021). Low-profile Broadband Metasurface Antenna for 5G Antenna-in-package Application. Electronic Components and Technology Conference.DOI
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Haitao Zhang, Xuanwu Kang, Ying-Kui Zheng, Hao Wu, K. Wei, Xinyu Liu, Tianchun Ye, Zhi Jin (2021). Investigation on Dynamic Characteristics of AlGaN/GaN Lateral Schottky Barrier Diode. Micromachines.DOI
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Jie Gu, Zhenhua Wu, Qingzhu Zhang, Jiaxin Yao, Zhaohao Zhang, Junjie Li, Yuwei Cai, Renren Xu, Gaobo Xu, Huaxiang Yin, Junfeng Li, Wenwu Wang, Tianchun Ye (2020). Quantum Dot With a Diamond-Shaped Channel MOSFET on a Bulk Si Substrate. IEEE Transactions on Electron Devices.DOI
Lu Sun, Bin Wu, Tianchun Ye (2020). A Low-Complexity QR Decomposition with Novel Modified RVD for MIMO Systems. IEICE Transactions on Fundamentals of Electronics Communications and Computer Sciences.DOI
Zhi‐An Wang, Binhong Li, Jianfei Wu, Wenxin Zhao, Bo Li, Hainan Liu, Chongjie Guan, Shiwei Feng, Jiajun Luo, Tianchun Ye (2020). A comparison study on electromagnetic susceptibility of current reference circuits with scaling-down technologies and schemes. Microelectronics Reliability.DOI
Shujuan Mao, Chao Zhao, Jin‐Biao Liu, Guilei Wang, Ben Li, Weibing Liu, Menghua Li, Yaodong Liu, Dan Zhang, Jing Xu, Jianfeng Gao, Yongliang Li, Wenwu Wang, Dapeng Chen, Junfeng Li, Tianchun Ye, Jun Luo (2020). Investigation of Ultrathin Ni Germanosilicide for Advanced pMOS Contact Metallization. IEEE Transactions on Electron Devices.DOI
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Lu Sun, Bin Wu, Tianchun Ye (2020). Design and VLSI Implementation of a Sorted MMSE QR Decomposition for 4×4 MIMO Detectors. IEICE Transactions on Fundamentals of Electronics Communications and Computer Sciences.DOI
Zhongmao Li, Wen Biao Fu, Jingwen Cheng, Jun-Jian Yin, Xin Qiu, Tianchun Ye (2020). Planar Bias-tee Circuit Using Gradient-meander Line for Broad-bandwidth Application. IEEE MTT-S International Wireless Symposium (IWS).DOI
Weizhuo Gan, Raphaël J. Prentki, Fei Liu, Jianhui Bu, Qingzhu Zhang, Huilong Zhu, Huaxiang Yin, Wenwu Wang, Tianchun Ye, Zhenhua Wu, Hong Guo (2020). A Multi-physics TCAD Framework for Fast and Accurate Simulation of SteepSlope Si-based Cold Source FET. International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).DOI
Cong Lu, Bin Wu, Tianchun Ye (2020). A Novel QoS-Aware A-MPDU Aggregation Scheduler for Unsaturated IEEE802.11n/ac WLANs. Electronics.DOI
Ke Li, Biao Deng, Haipeng Zhang, Fucheng Yu, Yanling Xue, Changqing Xie, Tianchun Ye, Tiqiao Xiao (2020). Comprehensive characterization of TSV etching performance with phase-contrast X-ray microtomography. Journal of Synchrotron Radiation.DOI
Qiang Xu, Wenjuan Xiong, Guilei Wang, Tianchun Ye (2020). Stressor SiNx contact etch stop layer (CESL) technology and its application in nano-scale transistors. Journal of Materials Science Materials in Electronics.DOI
Dan Zhang, Jing Xu, Jianfeng Gao, Anyan Du, Jing Zhang, Shujuan Mao, Yang Men, Pengfei Liu, Shihai Gu, Xue Gang Luo, Yaodong Liu, Guilei Wang, Junfeng Li, Chao Zhao, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2020). Impact of Ge pre-amorphization implantation on Co/Co-Ti/n + -Si contacts in advanced Co interconnects. Japanese Journal of Applied Physics.DOI
Qiang Xu, Guilei Wang, Wenjuan Xiong, Tianchun Ye (2020). Novel gap filling technique of shallow trench isolation structure in 16/14 nm FinFET using sub-atmospheric chemical vapor deposition. Journal of Materials Science Materials in Electronics.DOI
Weizhuo Gan, Raphaël J. Prentki, Fei Liu, Jianhui Bu, Kun Luo, Qingzhu Zhang, Huilong Zhu, Wenwu Wang, Tianchun Ye, Huaxiang Yin, Zhenhua Wu, Hong Yu Guo (2020). Design and Simulation of Steep-Slope Silicon Cold Source FETs With Effective Carrier Distribution Model. IEEE Transactions on Electron Devices.DOI
Dan Zhang, Anyan Du, Chao Feng Zhao, Jianfeng Gao, Shujuan Mao, Jing Xu, Shihai Gu, Yaodong Liu, Xue Gang Luo, Yongliang Li, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2020). Investigation of Barrier Property of Amorphous Co–Ti Layer as Single Barrier/Liner in Local Co Interconnects. IEEE Transactions on Electron Devices.DOI
Shujuan Mao, Chao Zhao, Jinbiao Liu, Guilei Wang, Menghua Li, Yaodong Liu, Xue Gang Luo, Dan Zhang, Jing Xu, Wenwu Wang, Dapeng Chen, Junfeng Li, Tianchun Ye, Jun Luo (2020). Specific Contact Resistivity Improvement by As Preamorphization Implantation for Ti-Based Ohmic Contacts on n+-Si. IEEE Transactions on Electron Devices.DOI
Hong Yang, Luwei Qi, Yanbo Zhang, Bo Tang, Qianqian Liu, Hao Xu, Xueli Ma, Xiaolei Wang, Yongliang Li, Huaxiang Yin, Junfeng Li, Huilong Zhu, Chao Feng Zhao, Wenwu Wang, Tianchun Ye (2020). Influence of an ALD TiN capping layer on the PBTI characteristics of n-FinFET with ALD HfO2/TiN-capping/TiAl gate stacks. Science China Information Sciences.DOI
Na Xi, Fujiang Lin, Tianchun Ye (2020). A Low-Spur and Intrinsically Aligned IL-PLL With Self-Feedback Injection Locked RO and Pseudo-Random Injection Locked Technique. IEEE Transactions on Circuits and Systems I Regular Papers.DOI
Yaodong Liu, Jing Xu, Jinbiao Liu, Guilei Wang, Xue Gang Luo, Dan Zhang, Shujuan Mao, Yongliang Li, Junfeng Li, Chao Zhao, Wenwu Wang, Bo Gao, Dapeng Chen, Tianchun Ye, Jun Luo (2020). Role of Carbon Pre-Germanidation Implantation on Enhancing the Thermal Stability of NiGe Films Below 10 nm Thickness. ECS Journal of Solid State Science and Technology.DOI
Dan Zhang, Jie Sheng, Chao Zhao, Jing Xu, Jianfeng Gao, Shujuan Mao, Yang Men, Pengfei Liu, Jing Zhang, Xue Gang Luo, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2020). Effects of Ni Film Thickness on the Properties of Ni-Based Silicides Formed on Both Highly Doped n- and p-Si Substrate. ECS Journal of Solid State Science and Technology.DOI
Qi Liu, Ye-Bing Gan, Tianchun Ye (2020). An ultra-fast and high-precision VCO frequency calibration technique for fractional-N frequency synthesizers. IEICE Electronics Express.DOI
Weikang Wan, Mei Xue, Liqiang Cao, Tianchun Ye, Qi-Dong Wang (2020). Wideband Low-profile AMC-based Patch Antenna for 5G Antenna-in-package Application. Electronic Components and Technology Conference.DOI
Weikang Wan, Mei Xue, Liqiang Cao, Tianchun Ye, Qi-Dong Wang (2020). Low-Profile Broadband Patch-Driven Metasurface Antenna. IEEE Antennas and Wireless Propagation Letters.DOI
Na Xi, Tianchun Ye, Fujiang Lin (2019). A 2.4 GHz quadrature LC-VCO with combination of tunable pulse coupling and parallel coupling to optimize phase noise. Analog Integrated Circuits and Signal Processing.DOI
Xiaogen Yin, Yongkui Zhang, Huilong Zhu, Guoxiang Wang, J. J. Li, Anyan Du, Chen Li, L. H. Zhao, Weixing Huang, Hong Yang, Lu Xie, X. Z. Ai, Y. B. Zhang, K. P. Jia, Zhenhua Wu, Xueli Ma, Qingzhu Zhang, Shujuan Mao, Jinjuan Xiang, Jianfeng Gao, Xiaobin He, G. B. Bai, Yihong Lu, N. Zhou, Zhenzhen Kong, Yongzheng Zhang, Jianwen Zhao, S. S., Zihao Xuan, Yangyang Li, Lili Li, Qinghai Zhang, Jing Han, R. L. Chen, Y. Qu, Tao Yang, Jun Luo, J. F. Li, Huaxiang Yin, Henry H. Radamson, Chao Zhao, W. W. Wang, Tianchun Ye (2019). Vertical Sandwich Gate-All-Around Field-Effect Transistors With Self-Aligned High-k Metal Gates and Small Effective-Gate-Length Variation. IEEE Electron Device Letters.DOI
Ruixuan Wu, Lisong Dong, Rui Chen, Tianchun Ye, Yayi Wei (2019). A method for compensating lithographic influence of EUV mask blank defects by an advanced genetic algorithm. International Conference on Extreme Ultraviolet Lithography.DOI
Yunyun Hao, Lisong Dong, Xi Chen, Rui Chen, Taian Fan, Yayi Wei, Tianchun Ye (2019). Impact of EUV multilayer mask defects on imaging performance and its correction methods. International Conference on Extreme Ultraviolet Lithography.DOI
Pengzheng Gao, Xiaojing Su, Weijie Shi, Yayi Wei, Tianchun Ye (2019). Sub-Resolution Assist Feature Cleanup Based on Grayscale Map. IEEE Transactions on Semiconductor Manufacturing.DOI
Xueli Ma, Lixing Zhou, Jinjuan Xiang, Hong Yang, Xiaolei Wang, Yongliang Li, Jing Zhang, Chao Zhao, Huaxiang Yin, Wenwu Wang, Tianchun Ye (2019). Identification of a suitable passivation route for high-k/SiGe interface based on ozone oxidation. Applied Surface Science.DOI
Longda Zhou, Ying Luo, Eddy Roger Simoen, Hong Yang, Huaxiang Yin, Anyan Du, Huilong Zhu, Chao Zhao, Wenwu Wang, Tianchun Ye, Guilei Wang, Xiaogen Yin, Bo Tang, Qianqian Liu, Zhigang Ji, Hao Xu, Zhenzhen Kong, Haojie Jiang (2019). Comparison of NBTI kinetics in RMG Si p-FinFETs featuring Atomic Layer Deposition Tungsten (ALD W) Filling Metal Using B2H6 and SiH4 Precursors.DOI
Na Xi, Fujiang Lin, Tianchun Ye (2019). A Low Phase Noise, High Phase Accuracy Quadrature LC-VCO With Dual-Tail Current Biasing to Insert Reconfigurable Phase Delay. IEEE Transactions on Circuits & Systems II Express Briefs.DOI
Dan Zhang, Shujuan Mao, Guilei Wang, Jing Xu, Xue Gang Luo, Chao Zhao, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2019). Exploration of the impact of interface states density on the specific contact resistivity in TiSi x /n + -Si Ohmic contacts through high-low frequency method. Japanese Journal of Applied Physics.DOI
Xiaojing Su, Dong Shen, Yayi Wei, Taian Fan, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen, Tianchun Ye (2019). Probability prediction model for bridging defects induced by combined influences from lithography and etch variations. Journal of Micro/Nanopatterning Materials and Metrology.DOI
Kai Han, Xiaolei Wang, Jinjuan Xiang, Lixing Zhou, Jiazhen Zhang, Yanrong Wang, Xueli Ma, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, Wenwu Wang (2019). Evaluation of hole mobility degradation by remote Coulomb scattering in Ge pMOSFETs. Semiconductor Science and Technology.DOI
Dan Zhang, Jing Xu, Shujuan Mao, Chao Feng Zhao, Guilei Wang, Xue Gang Luo, Junfeng Li, Yongliang Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2019). Co-sputtering Co–Ti alloy as a single barrier/liner for Co interconnects and thermal stability enhancement using TiN metal capping. Journal of Materials Science Materials in Electronics.DOI
Dan Zhang, Chao Zhao, Jun Luo, Shujuan Mao, Guilei Wang, Jing Xu, Xue Gang Luo, Junfeng Li, Yongliang Li, Wenwu Wang, Dapeng Chen, Tianchun Ye (2019). Experimental investigation of fundamental film properties for Co1−xTix alloying films with different compositions (0 ≤ x≤1). Journal of Materials Science Materials in Electronics.DOI
Tianyang Gai, Ying Chen, Pengzheng Gao, Xiaojing Su, Lisong Dong, Yajuan Su, Yayi Wei, Tianchun Ye (2019). Sample patterns extraction from layout automatically based on hierarchical cluster algorithm for lithography process optimization.DOI
Lixing Zhou, Xiaolei Wang, Xueli Ma, Jinjuan Xiang, Chao Zhao, Tianchun Ye, Wenwu Wang (2019). Understanding of mobility degradation induced by gate charges of Ge pMOSFET. IEEE Electron Devices Technology and Manufacturing Conference (EDTM).DOI
Linjie Zhu, Bin Wu, Tianchun Ye (2019). An Enhanced ARQ Scheme for A-MPDU Transmission Under Error-Prone WLANs. IEEE Communications Letters.DOI
Guilei Wang, Mohammadreza Kolahdouz, Jun Luo, Changliang Qin, Shihai Gu, Zhenzhen Kong, Xiaogen Yin, Wenjuan Xiong, Xuewei Zhao, Jinbiao Liu, Tao Yang, Junfeng Li, Huaxiang Yin, Huilong Zhu, Wenwu Wang, Chao Zhao, Tianchun Ye, Henry H. Radamson (2019). Growth of SiGe layers in source and drain regions for 10 nm node complementary metal-oxide semiconductor (CMOS). Journal of Materials Science Materials in Electronics.DOI
Xueli Ma, Jinjuan Xiang, Lixing Zhou, Xiaolei Wang, Yongliang Li, Hong Yang, Jing Zhang, CHAO FANG ZHAO, Huaxiang Yin, Wenwu Wang, Tianchun Ye (2019). Comprehensive Study and Design of High-k/SiGe Gate Stacks with Interface-Engineering by Ozone Oxidation. ECS Journal of Solid State Science and Technology.DOI
Zhou Wang, Bin Wu, Tianchun Ye (2019). An improved implementation of sum-product algorithm for LDPC decoder. IEICE Electronics Express.DOI
Xue Gang Luo, Guilei Wang, Jing Xu, Shujuan Mao, Dan Zhang, Shi Liu, Junfeng Li, Yongliang Li, Wenwu Wang, Dapeng Chen, Chao Zhao, Tianchun Ye, Jun Luo (2019). Investigation of NiGe Films Formed on Both n+- and p+-Ge with P and B Ion Implantation before Germanidation. ECS Journal of Solid State Science and Technology.DOI
Li-Xing Zhou, Xiao-Lei Wang, Xue-Li Ma, Jin-Juan Xiang, Chao Zhao, Tianchun Ye, Wen-Wu Wang (2019). Origin of fixed charges and dipole in GeOx/Al2O3 gate stack based on Ge. International Symposium on VLSI Technology, Systems, and Applications.DOI
Li-Xing Zhou, Xiao-Lei Wang, Jin-Juan Xiang, Chao Zhao, Tianchun Ye, Wen-Wu Wang (2019). Comprehensive Study of Interfacial Charges in the GeOX/Al2O3 Gate Stack of Ge by Ozone Oxidation. China Semiconductor Technology International Conference.DOI
Shu-Juan Mao, Chao Zhao, Guilei Wang, Jing Xu, Xue Luo, Dan Zhang, Wen-Wu Wang, Da-Peng Chen, Jun-Feng Li, Tianchun Ye, Jun Luo (2019). Impacts of Ge Preamorphization Implantation and Si Capping on the Specific Contact Resistivity of Ni(Pt)SiGe/p+-SiGe Contacts. IEEE Transactions on Electron Devices.DOI
Li-Xing Zhou, Xiao-Lei Wang, Kai Han, Xue-Li Ma, Yan-Rong Wang, Jin-Juan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, Wen-Wu Wang (2019). Experimental Investigation of Remote Coulomb Scattering on Mobility Degradation of Ge pMOSFET by Various PDA Ambiences. IEEE Transactions on Electron Devices.DOI
Yu Pan, Hua-Xiang Yin, Kailiang Huang, Zhao-Hao Zhang, Qing-Zhu Zhang, Kun-Peng Jia, Zhen-Hua Wu, Kun Luo, Jia-Han Yu, Jun-Feng Li, Wen-Wu Wang, Tianchun Ye (2019). Novel 10-nm Gate Length MoS2 Transistor Fabricated on Si Fin Substrate. IEEE Journal of the Electron Devices Society.DOI
Weikang Wan, Qi-Dong Wang, Tianchun Ye (2019). Research of Low-profile High Performance new AMC Antenna for 5G mm-Wave AiP Application. International Conference on Electronic Packaging Technology.DOI
Zhao-Hao Zhang, Gao-Bo Xu, Qing-Zhu Zhang, Zhaozhao Hou, Jun-Jie Li, Zhen-Zhen Kong, Yong-Kui Zhang, Jin-Juan Xiang, Qiu-Xia Xu, Zhen-Hua Wu, Hui-Long Zhu, Hua-Xiang Yin, Wen-Wu Wang, Tianchun Ye (2019). FinFET With Improved Subthreshold Swing and Drain Current Using 3-nm Ferroelectric Hf0.5Zr0.5O2. IEEE Electron Device Letters.DOI
Na Xi, Fujiang Lin, Tianchun Ye (2018). A low injection spur injection-locked LC-QVCO with self-injection technique. IEEE International Conference on Integrated Circuits, Technologies and Applications (ICTA).DOI
Lixing Zhou, Xiaolei Wang, Kai Han, Xueli Ma, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, Henry H. Radamson, Wenwu Wang (2018). Understanding dipole formation at dielectric/dielectric hetero-interface. Applied Physics Letters.DOI
Shujuan Mao, Guilei Wang, Jing Xu, Dan Zhang, Xue Gang Luo, Wenwu Wang, Dapeng Chen, Junfeng Li, Anyan Du, Chao Zhao, Tianchun Ye, Jun Luo (2018). Improved Ti germanosilicidation by Ge pre-amorphization implantation (PAI) for advanced contact technologies. Microelectronic Engineering.DOI
Lixing Zhou, Xiaolei Wang, Xueli Ma, Kai Han, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, Wenwu Wang (2018). Comprehensive investigation of the interfacial charges and dipole in GeO x /Al 2 O 3 gate stacks of Ge MOS capacitor by postdeposition annealing. Japanese Journal of Applied Physics.DOI
Jianfang He, Lisong Dong, Lijun Zhao, Yayi Wei, Tianchun Ye (2018). Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes. Applied Optics.DOI
Lixing Zhou, Xiaolei Wang, Xueli Ma, Kai Han, Yanrong Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Chao Zhao, Tianchun Ye, Wenwu Wang (2018). Identification of interfacial defects in a Ge gate stack based on ozone passivation. Semiconductor Science and Technology.DOI
Ningyuan Duan, Guilei Wang, Jing Xu, Shujuan Mao, Xue Gang Luo, Dan Zhang, Wenwu Wang, Dapeng Chen, Junfeng Li, Shi Liu, Chao Zhao, Tianchun Ye, Jun Luo (2018). Enhancing the thermal stability of NiGe by prior-germanidation fluorine implantation into Ge substrate. Japanese Journal of Applied Physics.DOI
Xue Gang Luo, Guilei Wang, Jing Xu, Ningyuan Duan, Shujuan Mao, Shi Liu, Junfeng Li, Wenwu Wang, Dapeng Chen, Chao Zhao, Tianchun Ye, Jun Luo (2018). Impact of Ge pre-amorphization implantation on forming ultrathin TiGe x on both n- and p-Ge substrate. Japanese Journal of Applied Physics.DOI
Hong Yang, Weichun Luo, Longda Zhou, Hao Xu, Bo Tang, Eddy Roger Simoen, Huaxiang Yin, Huilong Zhu, Chao Zhao, Wenwu Wang, Tianchun Ye (2018). Impact of ALD TiN Capping Layer on Interface Trap and Channel Hot Carrier Reliability of HKMG nMOSFETs. IEEE Electron Device Letters.DOI
Qiuxia Xu, Wei Zou, Gaobo Xu, Shan Tang, Guilong Tao, Siamak Salimian, Jinbiao Liu, Qingqing Liang, Yao Wang, Jinjuan Xiang, Xiaolei Wang, Huilong Zhu, Junfeng Li, Chao Zhao, Deven Raj, Helen L. Maynard, Dapeng Chen, Tianchun Ye (2018). Band-Edge Work Function Obtained by Plasma Doping TiN Metal Gate for nMOS Device Application. IEEE Transactions on Electron Devices.DOI
Ling Ma, Qiang Wu, Lisong Dong, Qiaoqiao Li, Yayi Wei, Tianchun Ye (2018). Development defect model for immersion photolithography. Journal of Micro/Nanopatterning Materials and Metrology.DOI
Yayi Wei, Ying Chen, Yajuan Su, Tianyang Gai, Xiaojing Su, Tianchun Ye (2018). Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development.DOI
Libin Zhang, Lisong Dong, Lijun Zhao, Tianchun Ye, Yayi Wei, Jianfang He (2018). The method for optimizing mask parameter suitable for lithography process.DOI
Qingzhu Zhang, Huaxiang Yin, Lingkuan Meng, Jiaxin Yao, Junjie Li, Guilei Wang, Yudong Li, Zhenhua Wu, Wenjuan Xiong, Hong Yang, Hailing Tu, Junfeng Li, Chao Zhao, Wenwu Wang, Tianchun Ye (2018). Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process. IEEE Electron Device Letters.DOI
Tianchun Ye (2018). Foreword to the Journal of Microelectronic Manufacturing Generalized Euler'Constant Family. Journal of Microelectronic Manufacturing.DOI
Zhou Wang, Bin Wu, Tianchun Ye (2018). FPGA and ASIC implementation of reliable and effective architecture for a LTE downlink transmitter. IEICE Electronics Express.DOI
Su-Mei Wang, Mei-Yin Yang, Jun Luo, Chao Zhao, Wen-Wu Wang, Tianchun Ye (2018). Switching of Exchange-Coupled Perpendicularly Magnetized Layers Under Spin–Orbit Torque. IEEE transactions on magnetics.DOI
Jun Luo, Shu-Juan Mao, Jing Xu, Guilei Wang, Dan Zhang, Xue Luo, Ning-Yuan Duan, Shi Liu, Wen-Wu Wang, Da-Peng Chen, Jun-Feng Li, Chao Zhao, Tianchun Ye (2018). On the manifestation of Ge pre-amorphization implantation (PAI) impact on both the formation of ultrathin TiSix and the specific contact resistivity in TiSix/n-Si contacts for sub-16/14 nm nodes and beyond. International Workshop on Junction Technology.DOI
Li-Jun Zhao, Lisong Dong, Li-Bin Zhang, Yayi Wei, Tianchun Ye (2018). Resist model setup for negative tone development at 14NM node. China Semiconductor Technology International Conference.DOI
Longda Zhou, Bo Tang, Hong Yang, Hao Xu, Yong-Liang Li, E. Simoen, Hua-Xiang Yin, Hui-Long Zhu, Chao Zhao, Wen-Wu Wang, Da-Peng Chen, Tianchun Ye (2018). Physical Mechanism Underlying the Time Exponent Shift in the Ultra-fast NBTI of High-k/Metal gated p-CMOSFETs. International Symposium on the Physical and Failure Analysis of Integrated Circuits.DOI
Shu-Juan Mao, Guilei Wang, Jing Xu, Xue Luo, Dan Zhang, Ning-Yuan Duan, Shi Liu, Wen-Wu Wang, Da-Peng Chen, Jun-Feng Li, Chao Zhao, Tianchun Ye, Jun Luo (2018). Impact of Ge Preamorphization Implantation on Both the Formation of Ultrathin TiSix and the Specific Contact Resistivity in TiSix/n-Si Contacts. IEEE Transactions on Electron Devices.DOI
Yanrong Wang, Hong Yang, Hao Xu, Weichun Luo, Luwei Qi, Shuxiang Zhang, Wenwu Wang, Yan Li Jiang, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2017). Stress-induced leakage current characteristics of PMOS fabricated by a new multi-deposition multi-annealing technique with full gate last process. Chinese Physics B.DOI
Zhen Liu, Tianchun Ye, Bin Wu, Xiao Ge Zhu (2017). An improved implementation of MAX* operation for Turbo decoder. IEICE Electronics Express.DOI
Hailiang Li, Tianchun Ye, Lina Shi, Changqing Xie (2017). Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching. Journal of Micromechanics and Microengineering.DOI
Lisong Dong, Wenhui Chen, Taian Fan, Xiaojing Su, Yayi Wei, Tianchun Ye (2017). Mitigating the influence of wafer topography on the implantation process in optical lithography. Optics Letters.DOI
Xu Qian, Bin Wu, Tianchun Ye (2017). QoS-Aware A-MPDU Retransmission Scheme for 802.11n/ac/ad WLANS. IEEE Communications Letters.DOI
Xu Qian, Bin Wu, Tianchun Ye (2017). Enhanced aggregation scheduler design in industrial 802.11 devices. Electronics Letters.DOI
Zhen Liu, Bin Wu, Tianchun Ye (2017). Improved Turbo Decoding With Multivariable Taylor Series Expansion. IEEE Communications Letters.DOI
Guilei Wang, Jun Luo, Jinbiao Liu, Tao Yang, Yefeng Xu, Junfeng Li, Huaxiang Yin, Yan Li Jiang, Huilong Zhu, Chao Zhao, Tianchun Ye, Henry H. Radamson (2017). pMOSFETs Featuring ALD W Filling Metal Using SiH4 and B2H6 Precursors in 22 nm Node CMOS Technology. Nanoscale Research Letters.DOI
Libin Zhang, Lisong Dong, Xiaojing Su, Yayi Wei, Tianchun Ye (2017). New alignment mark designs in single patterning and self-aligned double patterning. Microelectronic Engineering.DOI
Xiaolei Wang, Jinjuan Xiang, Kai Han, Shengkai Wang, Jun Luo, Chao Zhao, Tianchun Ye, Henry H. Radamson, Eddy Roger Simoen, Wenwu Wang (2017). Physically Based Evaluation of Effect of Buried Oxide on Surface Roughness Scattering Limited Hole Mobility in Ultrathin GeOI MOSFETs. IEEE Transactions on Electron Devices.DOI
Libin Zhang, Yaobin Feng, Lisong Dong, Xiaojing Su, Zhengguo Tian, Chao Fang, Yayi Wei, Tianchun Ye (2017). New alignment mark design structures for higher diffraction order wafer quality enhancement. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.DOI
Xiaojing Su, Lisong Dong, Jiaxin Lin, Ying Chen, Yayi Wei, Tianchun Ye, Chunshan Du, Feng Shao, Recco Zhang, Yu Zhu, Junjiang Lei, Minghui Fan (2017). Hotspots fixing flow in NTD process by using DTCO methodology at 10nm metal 1 layer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.DOI
Lijun Zhao, Ying Chen, Xiaojing Su, Yajuan Su, Yayi Wei, Tianchun Ye (2017). Enhancing manufacturability of standard cells by using DTCO methodology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.DOI
Xia Kaifeng, Bin Wu, Tao Xiong, Tianchun Ye (2017). A Memory-Based FFT Processor Design With Generalized Efficient Conflict-Free Address Schemes. IEEE Transactions on Very Large Scale Integration (VLSI) Systems.DOI
Guilei Wang, Jun Luo, Changliang Qin, Renrong Liang, Yefeng Xu, Jinbiao Liu, Junfeng Li, Huaxiang Yin, Yan Li Jiang, Huilong Zhu, Jun Xu, Chao Zhao, Henry H. Radamson, Tianchun Ye (2017). Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors. Nanoscale Research Letters.DOI
Xiaolei Wang, Jinjuan Xiang, Chao Zhao, Tianchun Ye, Wenwu Wang (2017). Oxidation mechanism and surface passivation of Germanium by ozone. IEEE Electron Devices Technology and Manufacturing Conference (EDTM).DOI
Shujuan Mao, Jing Xu, Guilei Wang, Jun Luo, Ningyuan Duan, Eddy Roger Simoen, Henry H. Radamson, Wenwu Wang, Dapeng Chen, Junfeng Li, Chao Zhao, Tianchun Ye (2017). On the Manifestation of Ge Pre-Amorphization Implantation (PAI) in Forming Ultrathin TiSixfor Ti Direct Contact on Si in Sub-16/14 nm Complementary Metal-Oxide-Semiconductor (CMOS) Technology Nodes. ECS Journal of Solid State Science and Technology.DOI
J. B. Liu, Jun Luo, Eddy Roger Simoen, Guilei Wang, Jinjuan Xiang, Junfeng Li, Chao Feng Zhao, Tianchun Ye (2017). Hot Implantations of P into Ge: Impact on the Diffusion Profile. ECS Journal of Solid State Science and Technology.DOI
Ningyuan Duan, Guilei Wang, Jun Luo, Shujuan Mao, Xue Gang Luo, Jing Xu, Wenwu Wang, Shi Liu, Dapeng Chen, Junfeng Li, Chao Zhao, Tianchun Ye (2017). A Modified Scheme to Reduce the Specific Contact Resistivity of NiSi/Si Contacts by Means of Dopant Segregation Technique. ECS Journal of Solid State Science and Technology.DOI
Kai-Feng XIA, Bin Wu, Tao XIONG, Tianchun Ye, Chengying Chen (2017). A Hardware Efficient Multiple-Stream Pipeline FFT Processor for MIMO-OFDM Systems. IEICE Transactions on Fundamentals of Electronics Communications and Computer Sciences.DOI
Li-Jun Zhao, Lisong Dong, Wen-Hui Chen, Yayi Wei, Tianchun Ye, Li-Wan Yue, Yun-Tao Jiang, Qiang Wu (2017). Necessity of resist model in source mask optimization for negative tone development process.DOI
Zhi-Qian Zhao, Xiao-Lei Wang, Jing Zhang, Chao Zhao, Tianchun Ye, Wen-Wu Wang (2017). Experimental investigation on growth mechanism of GeOx layer formed by plasma post oxidation based on angle resolved X-ray photoelectron spectroscopy. IEEE Electron Devices Technology and Manufacturing Conference.DOI
Li-Xing Zhou, Xiao-Lei Wang, Xue-Li Ma, Jin-Juan Xiang, Hong Yang, Chao Zhao, Tianchun Ye, Wen-Wu Wang (2017). Hole mobility degradation by remote Coulomb scattering and charge distribution in Al2O3/GeOx gate stacks in bulk Ge pMOSFET with GeOx grown by ozone oxidation.DOI
Yong-Hao Liang, Enliang Wang, Yilei Hua, Chang-Qing Xie, Tianchun Ye (2017). Single-focus spiral zone plates. Optics Letters.DOI
韩茜茜,欧毅,李志刚,欧文,叶甜春(2016). Band 40波段体声波滤波器的设计. 《微纳电子技术》.
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Xixi Han, Yi Ou, Zhigang Li, Wen Ou, Dapeng Chen, Tianchun Ye (2016). Simulation and fabrication of thin film bulk acoustic wave resonator. Journal of Semiconductors.DOI
Hao Xu, Hong Yang, Yanrong Wang, Wenwu Wang, Weichun Luo, Luwei Qi, Junfeng Li, Chao Zhao, Dapeng Chen, Tianchun Ye (2016). Temperature- and voltage-dependent trap generation model in high- k metal gate MOS device with percolation simulation. Chinese Physics B.DOI
Hao Xu, Hong Yang, Weichun Luo, Yefeng Xu, Yanrong Wang, Bo Tang, Wenwu Wang, Luwei Qi, Junfeng Li, Yan Li Jiang, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2016). Study on influences of TiN capping layer on time-dependent dielectric breakdown characteristic of ultra-thin EOT high- k metal gate NMOSFET with kMC TDDB simulations. Chinese Physics B.DOI
Hao Xu, Hong Yang, Yanrong Wang, Wenwu Wang, Guangxing Wan, Shangqing Ren, Weichun Luo, Luwei Qi, Chao Zhao, Dapeng Chen, Xinyu Liu, Tianchun Ye (2016). Series resistance effect on time zero dielectrics breakdown characteristics of MOSCAP with ultra-thin EOT high-k/metal gate stacks. Journal of Semiconductors.DOI
Yuan Teng, Yangjun Zhu, Zhengsheng Han, Tianchun Ye (2016). Theoretical modification of the negative Miller capacitance during the switching transients of IGBTs. Journal of Semiconductors.DOI
Miao Xu, Huilong Zhu, Yanbo Zhang, Yanbo Zhang, Qiuxia Xu, Yongkui Zhang, Yongkui Zhang, Changliang Qin, Qingzhu Zhang, Huaxiang Yin, Hao Xu, Shuai Chen, Jun Luo, Chunlong Li, Chao Zhao, Tianchun Ye (2016). Two methods of tuning threshold voltage of bulk FinFETs with replacement high-k metal-gate stacks. Solid-State Electronics.DOI
Lisong Dong, Libin Zhang, Xiaojing Su, Zhiyang Song, Yayi Wei, Tianchun Ye (2016). Optimization of resist parameters to improve the profile and process window of the contact pattern in advanced node. Journal of Micro/Nanopatterning Materials and Metrology.DOI
Qingzhu Zhang, Huaxiang Yin, Jun Luo, Hong Yang, Lingkuan Meng, Yudong Li, Zhenhua Wu, Yanbo Zhang, Yongkui Zhang, Changliang Qin, Junjie Li, Jianfeng Gao, Guilei Wang, Wenjuan Xiong, Jinjuan Xiang, Zhangyu Zhou, Shujian Mao, Gaobo Xu, Jinbiao Liu, Yang Qu, Tao Yang, Junfeng Li, Qiuxia Xu, Jiang Yan, Huilong Zhu, Chao Feng Zhao, Tianchun Ye (2016). FOI FinFET with ultra-low parasitic resistance enabled by fully metallic source and drain formation on isolated bulk-fin. Technical digest - International Electron Devices Meeting/Technical digest.DOI
Lijun Zhao, Yayi Wei, Tianchun Ye (2016). Analysis of multi-e-beam lithography for cutting layers at 7-nm node. Journal of Micro/Nanopatterning Materials and Metrology.DOI
Ningyuan Duan, Jun Luo, Guilei Wang, Jinbiao Liu, Eddy Roger Simoen, Shujuan Mao, Henry H. Radamson, Xiaolei Wang, Junfeng Li, Wenwu Wang, Chao Zhao, Tianchun Ye (2016). Reduction of NiGe/n- and p-Ge Specific Contact Resistivity by Enhanced Dopant Segregation in the Presence of Carbon During Nickel Germanidation. IEEE Transactions on Electron Devices.DOI
Xiaolei Wang, Zhiqian Zhao, Jinjuan Xiang, Wenwu Wang, Jing Zhang, Chao Zhao, Tianchun Ye (2016). Experimental investigation on oxidation kinetics of germanium by ozone. Applied Surface Science.DOI
Tiezhu Zhu, Taishan Mo, Tianchun Ye (2016). 2.5 Gbit/s Optical Receiver Front-End Circuit with High Sensitivity and Wide Dynamic Range. Journal of Optical Communications.DOI
Changliang Qin, Guilei Wang, Mohammadreza Kolahdouz, Jun Luo, Huaxing Yin, Ping Yang, Junfeng Li, Huilong Zhu, Zhao Chao, Tianchun Ye, Henry H. Radamson (2016). Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 14nm node FinFETs. Solid-State Electronics.DOI
Guilei Wang, Changliang Qin, Huaxiang Yin, Jun Luo, Ningyuan Duan, Ping Yang, Xingyu Gao, Tao Yang, Junfeng Li, Yan Li Jiang, Huilong Zhu, Wenwu Wang, Dapeng Chen, Tianchun Ye, Chao Zhao, Henry H. Radamson (2016). Study of SiGe selective epitaxial process integration with high-k and metal gate for 16/14nm nodes FinFET technology. Microelectronic Engineering.DOI
Xiaolei Wang, Jinjuan Xiang, Shengkai Wang, Wenwu Wang, Chao Zhao, Tianchun Ye, Yuhua Xiong, Jing Zhang (2016). Remote interfacial dipole scattering and electron mobility degradation in Ge field-effect transistors with GeO x /Al 2 O 3 gate dielectrics. Journal of Physics D Applied Physics.DOI
Weichun Luo, Hong Yang, Wenwu Wang, Yefeng Xu, Bo Tang, Shangqing Ren, Hao Xu, Yanrong Wang, Luwei Qi, Yan Li Jiang, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2016). Accurate lifetime prediction for channel hot carrier stress on sub-1 nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer. Microelectronics Reliability.DOI
Wen Qi Fang, Anabela Veloso, Eddy Roger Simoen, Moonju Cho, Nadine Collaert, Aaron Thean, Jun Luo, Chao Zhao, Tianchun Ye, Cor L. Claeys (2016). Impact of the Effective Work Function Gate Metal on the Low-Frequency Noise of Gate-All-Around Silicon-on-Insulator NWFETs. IEEE Electron Device Letters.DOI
J. B. Liu, Jun Luo, Eddy Roger Simoen, Yuting Niu, Fei Yang, G. L. Wang, W. W. Wang, D. P. Chen, J. F. Li, Chao Feng Zhao, Tianchun Ye (2016). Junction Control by Carbon and Phosphorus Co-Implantation in Pre-Amorphized Germanium. ECS Journal of Solid State Science and Technology.DOI
Guilei Wang, Jun Luo, Chang-Liang Qin, H. Cui, Jinbiao Liu, Kun-Peng Jia, Junjie Li, Tao Yang, Jun-Feng Li, Hua-Xiang Yin, Chao Zhao, Tianchun Ye, Ping Yang, G. Jayakumar, H. Radamson (2016). Integration of Selective Epitaxial Growth of SiGe/Ge Layers in 14nm Node FinFETs.DOI
Jun Luo, Jinbiao Liu, E. Simoen, Guilei Wang, Shu-Juan Mao, H. Radamson, Ning-Yuan Duan, Jun-Feng Li, Wen-Wu Wang, Da-Peng Chen, Chao Zhao, Tianchun Ye (2016). (Invited) On the Manipulation of Phosphorus Diffusion as Well as the Reduction of Specific Contact Resistivity in Ge by Carbon Co-Doping.DOI
Yanbin Luo, Chengyan Ma, Yebing Gan, Min Qian, Tianchun Ye (2015). An inductorless multi-mode RF front end for GNSS receiver in 55 nm CMOS. Journal of Semiconductors.DOI
Xinkai Li, Zongliang Huo, Lei Jin, Dandan Jiang, Peizhen Hong, Qiang Xu, Zhaoyun Tang, Chunlong Li, Tianchun Ye (2015). Impact of continuing scaling on the device performance of 3D cylindrical junction-less charge trapping memory. Journal of Semiconductors.DOI
Shang-Qing Ren, Hong Yang, Wenwu Wang, Bo Tang, Zhaoyun Tang, Xiao‐Lei Wang, Hao Xu, Weichun Luo, Chao Zhao, Yan Li Jiang, Dapeng Chen, Tianchun Ye (2015). Energy distribution extraction of negative charges responsible for positive bias temperature instability. Chinese Physics B.DOI
Shang-Qing Ren, Hong Yang, Bo Tang, Hao Xu, Wei-Chun Luo, Zhao-Yun Tang, Ye-Feng Xu, Jing Xu, Dahai Wang, Jun-Feng Li, Jiang Yan, Chao Zhao, Da-Peng Chen, Tianchun Ye, Wen-Wu Wang (2015). Characterization of positive bias temperature instability of NMOSFET with high-k/metal gate last process.DOI
Yanrong Wang, Hong Yang, Hao Xu, Xiaolei Wang, Weichun Luo, Luwei Qi, Shuxiang Zhang, Wenwu Wang, Yan Li Jiang, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2015). Influence of multi-deposition multi-annealing on time-dependent dielectric breakdown characteristics of PMOS with high- k /metal gate last process. Chinese Physics B.DOI
Le Yang, Tianchun Ye, Bin Wu, Ruiqi Zhang (2015). LTE turbo decoder design. Journal of Semiconductors.DOI
Miao Xu, Huaxiang Yin, Huilong Zhu, Xiaolong Ma, Weijia Xu, Yongkui Zhang, Zhiguo Zhao, Jun Luo, Hong Yang, Chunlong Li, Lingkuan Meng, Peizhen Hong, Jinjuan Xiang, Jianfeng Gao, Qiang Xü, Wenjuan Xiong, Dahai Wang, Junfeng Li, Chao Feng Zhao, Dapeng Chen, Simon Yang, Tianchun Ye (2015). Device parameter optimization for sub-20 nm node HK/MG-last bulk FinFETs. Journal of Semiconductors.DOI
Luwei Qi, Hong Yang, Shang-Qing Ren, Yefeng Xu, Weichun Luo, Hao Xu, Yanrong Wang, Bo Tang, Wenwu Wang, Yan Li Jiang, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2015). Influence of ultra-thin TiN thickness (1.4 nm and 2.4 nm) on positive bias temperature instability (PBTI) of high- k /metal gate nMOSFETs with gate-last process. Chinese Physics B.DOI
Kunpeng Jia, Jun Luo, Rongyan Hu, Jun Zhan, Heshi Cao, Yajuan Su, Huilong Zhu, Ling Xie, Chao Zhao, Dapeng Chen, Tianchun Ye (2015). Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them. ECS Journal of Solid State Science and Technology.DOI
Qiuxia Xu, Gaobo Xu, Huajie Zhou, Huilong Zhu, Qingqing Liang, Jinbiao Liu, Junfeng Li, Jinjuan Xiang, Miao Xu, Jian Zhong, Xu Weijia, Chao Zhao, Dapeng Chen, Tianchun Ye (2015). Ion-Implanted TiN Metal Gate With Dual Band-Edge Work Function and Excellent Reliability for Advanced CMOS Device Applications. IEEE Transactions on Electron Devices.DOI
Qiuxia Xu, Gaobo Xu, Hualan Zhou, H. Zhu, J. Liu, Y. WANG, J. Li, Jinjuan Xiang, Quan Liang, Hanming Wu, J. Zhong, Min Xu, Wei Xu, Xiaolong Ma, X. Wang, X. Tong, D. Chen, Jing Sen Yan, Chao Zhao, Tianchun Ye (2015). Attainment of dual-band edge work function by using a single metal gate and single high-k dielectric via ion implantation for HP CMOS device. Solid-State Electronics.DOI
Wenhui Chen, Jun Luo, Lingkuan Meng, Junjie Li, Jinjuan Xiang, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Chao Zhao (2015). Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films. Thin Solid Films.DOI
Yanbin Luo, Min Qian, Yebing Gan, Chengyan Ma, Tianchun Ye (2015). Analysis and optimal design of SiGe HBT low noise amplifier for GNSS receiver. IEEE International Conference on Communication Technology (ICCT).DOI
Guilei Wang, M. Moeen, A. Abedin, Yefeng Xu, Jun Luo, Yiluan Guo, Changliang Qin, Zhaoyun Tang, Haizhou Yin, Junfeng Li, Yan Li Jiang, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye, Mohammadreza Kolahdouz, Henry H. Radamson (2015). Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs. Solid-State Electronics.DOI
Yanbin Luo, Chengyan Ma, Yebing Gan, Min Qian, Tianchun Ye (2015). A dual-band CMOS LC-VCO with highly linear frequency tuning characteristics. Microelectronics Journal.DOI
Hushan Cui, Jun Luo, Jing Xu, Jianfeng Gao, Jinjuan Xiang, Zhaoyun Tang, Xiaolei Wang, Yihong Lu, Xiaobin He, Tingting Li, Bo Tang, Jiahan Yu, Tao Yang, Jiang Yan, Junfeng Li, Chao Feng Zhao, Tianchun Ye (2015). Investigation of TaN as the wet etch stop layer for HKMG-last integration in the 22 nm and beyond nodes CMOS technology. Vacuum.DOI
Miao Xu, Huilong Zhu, Lichuan Zhao, Huaxiang Yin, Jian Zhong, Junfeng Li, Chao Zhao, Dapeng Chen, Tianchun Ye (2015). Improved Short Channel Effect Control in Bulk FinFETs With Vertical Implantation to Form Self-Aligned Halo and Punch-Through Stop Pocket. IEEE Electron Device Letters.DOI
Yunfei Liu, Haizhou Yin, Rui Li, Huilong Zhu, Chao Zhao, Pengfei Wang, Shaoning Mei, Tianchun Ye (2015). A Novel U-Shaped Finfet with Vertical Channels. ECS Meeting Abstracts.DOI
Yanbo Zhang, Huilong Zhu, Hao Wu, Yongkui Zhang, Zhiguo Zhao, Jian Zhong, Hong Yang, Qingqing Liang, Dahai Wang, Junfeng Li, Cheng Jia, Jinbiao Liu, Yuyin Zhao, Chunlong Li, Lingkuan Meng, Peizhen Hong, Junjie Li, Qiang Xü, Jianfeng Gao, Xiaobin He, Yihong Lu, Yue Zhang, Tao Yang, Yao Wang, Hushan Cui, Chao Zhao, Huaxiang Yin, Huicai Zhong, Haizhou Yin, Yan Li Jiang, Wenwu Wang, Dapeng Chen, Hongyu Yu, Simon Yang, Tianchun Ye (2015). Planar Bulk MOSFETs With Self-Aligned Pocket Well to Improve Short-Channel Effects and Enhance Device Performance. IEEE Transactions on Electron Devices.DOI
Kunpeng Jia, Yajuan Su, Yang Chen, Jun Luo, Jie Yang, Peng Fei Lv, Zihan Zhang, Huilong Zhu, Chao Zhao, Tianchun Ye (2015). Effects of defects and thermal treatment on the properties of graphene. Vacuum.DOI
Guo‐Ming Wang, Shibing Long, Zhaoan Yu, Meiyun Zhang, Tianchun Ye, Yang Li, Dinglin Xu, Hangbing Lv, Qi Liu, Ming Wang, Xiaoxin Xu, Hongtao Liu, Baohe Yang, Jordi Suñé, Ming Liu (2015). Improving resistance uniformity and endurance of resistive switching memory by accurately controlling the stress time of pulse program operation. Applied Physics Letters.DOI
Qiang Xu, Jun Luo, Guilei Wang, Tao Yang, Junfeng Li, Tianchun Ye, Dapeng Chen, Chao Zhao (2015). Application of ALD W films as gate filling metal in 22nm HKMG-last integration: Evaluation and improvement of the adhesion in CMP process. Microelectronic Engineering.DOI
Ke-Ke Zhang, Yun-Fei Liu, Hui-Long Zhu, Chao Zhao, Tianchun Ye, Haizhou Yin (2015). Doping profile optimisation in bulk FinFET channel and source/drain extension regions for low off–state leakage.DOI
Hao Wu, Miao Xu, Guang-Xing Wan, Hui-Long Zhu, Li-Chuan Zhao, X. Tong, Chao Zhao, Da-Peng Chen, Tianchun Ye (2014). On substrate dopant engineering for ET-SOI MOSFETs with UT-BOX.DOI
Xiaodong Tong, Hao Wu, Qingqing Liang, Huicai Zhong, Huilong Zhu, Chao Zhao, Tianchun Ye (2014). Design of two-terminal PNPN diode for high-density and high-speed memory applications. Journal of Semiconductors.DOI
蔺晓龙,何文涛,徐建华,叶甜春(2014). 卫星导航接收机中窄带干扰抑制算法. 《计算机仿真》.
Xueli Ma, Hong Yang, Wenwu Wang, Huaxiang Yin, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2014). An effective work-function tuning method of nMOSCAP with high-k/metal gate by TiN/TaN double-layer stack thickness. Journal of Semiconductors.DOI
Xueli Ma, Hong Yang, Wenwu Wang, Huaxiang Yin, Huilong Zhu, Chao Zhao, Dapeng Chen, Tianchun Ye (2014). The effects of process condition of top-TiN and TaN thickness on the effective work function of MOSCAP with high-k/metal gate stacks. Journal of Semiconductors.DOI
Hengliang Zhao, Huilong Zhu, Jian Zhong, Xiaolong Ma, Xing Hai Wei, Chao Zhao, Dapeng Chen, Tianchun Ye (2014). Simulations of backgate sandwich nanowire MOSFETs with improved device performance. Journal of Semiconductors.DOI
Xiao Ma, Zhankun Du, Chang Liu, Ke Liu, Yuepeng Yan, Tianchun Ye (2014). A fractional-Nfrequency synthesizer for wireless sensor network nodes. Journal of Semiconductors.DOI
Zhaoyun Tang, Bo Tang, Lichuan Zhao, Guilei Wang, Jing Xu, Yefeng Xu, Hongli Wang, Dahai Wang, Junfeng Li, Fujiang Lin, Yan Li Jiang, Chao Zhao, Tianchun Ye (2014). Impacts of Back Gate Bias Stressing on Device Characteristics for Extremely Thin SoI (ETSoI) MOSFETs. IEEE Electron Device Letters.DOI
Songang Peng, Zhi Hao Jin, Peng Ma, Dayong Zhang, Jingyuan Shi, Jiebin Niu, Xuan-yun Wang, Shaoqing Wang, Mei Li, Xinyu Liu, Tianchun Ye, Yanhui Zhang, Zhiying Chen, Guanghui Yu (2014). The sheet resistance of graphene under contact and its effect on the derived specific contact resistivity. Carbon.DOI
Zongliang Huo, Lei Jin, Yulong Han, Xinkai Li, Tianchun Ye, Ming Liu (2014). Low-temperature post-deposition annealing investigation for 3D charge trap flash memory by Kelvin probe force microscopy. Applied Physics A.DOI
Zhengyong Zhu, Huilong Zhu, Miao Xu, Jian Zhong, Chao Zhao, Dapeng Chen, Tianchun Ye (2014). A Novel Fin Electron–Hole Bilayer Tunnel Field-Effect Transistor. IEEE Transactions on Nanotechnology.DOI
Lichuan Zhao, Zhaoyun Tang, Bo Tang, Xueli Ma, Jinbiao Liu, Jinjuan Xiang, Jianfeng Gao, Chunlong Li, Xiaobin He, Cheng Jia, Mingzheng Ding, Hong Yang, Yefeng Xu, Jing Xu, Hongli Wang, Peng Liu, Peizhen Hong, Lingkuan Meng, Tingting Li, Wenjuan Xiong, Hao Wu, Junjie Li, Guilei Wang, Tao Yang, Hushan Cui, Yihong Lu, Xiaodong Tong, Jun Luo, Jian Zhong, Qiang Xu, Wenwu Wang, Junfeng Li, Huilong Zhu, Chao Zhao, Jiang Yan, Dapeng Chen, Simon Yang, Tianchun Ye (2014). Mitigation of Reverse Short-Channel Effect With Multilayer TiN/Ti/TiN Metal Gates in Gate Last PMOSFETs. IEEE Electron Device Letters.DOI
Xiaofeng He, Yuanjin Zheng, Chengyan Ma, Tianchun Ye (2014). A 95 dB dynamic range automatic gain control circuits and systems for Multi-standard Digital TV tuner. IEEE International Symposium on Circuits and Systems proceedings.DOI
Daisheng Zhang, Rui Jia, Chen Chen, Wuchang Ding, Zhi Hao Jin, Xinyu Liu, Tianchun Ye (2014). Reflectance and minority carrier lifetime of silicon nanoholes synthesized by chemical etching method. Chemical Physics Letters.DOI
Chao Feng Zhao, Tianchun Ye, Huilong Zhu, Huaxiang Yin, Jun Luo, Hong Yang, Chunlong Li, Tao Yang, Hushan Cui, Jianfeng Gao, Guilei Wang, Qiang Xu, Jinjuan Xiang, Yongkui Zhang, Zhiguo Zhao, Jinbiao Liu, Peizhen Hong, Lingkuan Meng, Tingting Li, Junjie Li, Xiaobin He, Wenjuan Xiong, Dahai Wang, Yihong Lu, Junfeng Li, Huicai Zhong, Haizhou Yin, Jiang Yan, Wenwu Wang (2014). Processing Challenges of CMOS Integration of Finfets with All-Last Gate Stacks. ECS Meeting Abstracts.DOI
Guilei Wang, Tianchun Ye, Jun Luo, Changliang Qin, Yefeng Xu, Tao Chen, Qiang Xu, Peizhen Hong, Tao Yang, Chunlong Li, Gaobo Xu, Jiahan Yu, Haizhou Yin, Junfeng Li, Yan Li Jiang, Huilong Zhu, Chao Feng Zhao, Henry H. Radamson (2014). Sige Selective Epitaxial Growth Process for 22 Nm Node CMOS and Beyond. ECS Meeting Abstracts.DOI
Yayi Wei, Chao Zhao, Tianchun Ye (2014). Analysis of mix-and-match litho approach for manufacturing 20nm logic-node products. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.DOI
Qiuxia Xu, Gaobo Xu, Yongliang Li, Huajie Zhou, Junfeng Li, Jiebin Niu, Mingzheng Ding, Dapeng Chen, Tianchun Ye (2014). Investigation of Key Technologies for Poly-Si/TaN/HfLaON/IL ${\rm SiO}_{2}$ Gate-Stacks in Advanced Device Applications. IEEE Transactions on Electron Devices.DOI
Dayong Zhang, Zhi Hao Jin, Jingyuan Shi, Peng Ma, Songang Peng, Xinyu Liu, Tianchun Ye (2014). The Anistropy of Field Effect Mobility of CVD Graphene Grown on Copper Foil. Small.DOI
Qi-Dong Wang, D. Guidotti, Liqiang Cao, De-Long Qiu, Daquan Yu, Shuling Wang, Xu-Gang Wang, Tianchun Ye, L. Wan (2014). Arrays of millimeter-wave silicon waveguides for interchip communication on glass interposer. Electronic Components and Technology Conference.DOI
Guilei Wang, Qiang Xu, Tao Yang, Jun Luo, Jinjuan Xiang, Jing Xu, Gaobo Xu, Chunlong Li, Junfeng Li, Jiang Yan, Chao Zhao, Dapeng Chen, Tianchun Ye (2013). Application of Atomic Layer Deposition Tungsten (ALD W) as Gate Filling Metal for 22 nm and Beyond Nodes CMOS Technology. ECS Transactions.DOI
Songang Peng, Zhi Hao Jin, Peng Ma, Guanghui Yu, Jingyuan Shi, Dayong Zhang, Jiao Chen, Xinyu Liu, Tianchun Ye (2013). Heavily p-type doped chemical vapor deposition graphene field-effect transistor with current saturation. Applied Physics Letters.DOI
Weichun Luo, Hong Yang, Wenwu Wang, Lichuan Zhao, Hao Xu, Shangqing Ren, Bo Tang, Zhaoyun Tang, Yefeng Xu, Jing Xu, Yan Li Jiang, Chao Zhao, Dapeng Chen, Tianchun Ye (2013). Physical understanding of different drain-induced-barrier-lowering variations in high-k/metal gate n-channel metal-oxide-semiconductor-field-effect-transistors induced by charge trapping under normal and reverse channel hot carrier stresses. Applied Physics Letters.DOI
Jun Luo, Zhi‐Jun Qiu, Jian Hua Deng, Chao Zhao, Junfeng Li, Wenwu Wang, Dapeng Chen, Dongping Wu, Mikael Östling, Tianchun Ye, Shi‐Li Zhang (2013). Variation of Schottky barrier height induced by dopant segregation monitored by contact resistivity measurements. Microelectronic Engineering.DOI
Wei Juan Wang, Ling Li, Zhuoyu Ji, Tianchun Ye, Nianduan Lu, Zhigang Li, Dongmei Li, Ming Liu (2013). Modified Transmission Line Model for Bottom-Contact Organic Transistors. IEEE Electron Device Letters.DOI
Jun Luo, Zhi‐Jun Qiu, Jian Hua Deng, Chao Zhao, Junfeng Li, Wenwu Wang, Dapeng Chen, Dongping Wu, Mikael Östling, Tianchun Ye, Shi‐Li Zhang (2013). Effects of carbon pre-silicidation implant into Si substrate on NiSi. Microelectronic Engineering.DOI
Yulong Han, Zongliang Huo, Xinkai Li, Guoxing Chen, Xiaonan Yang, Dong Zhang, Yong Wang, Tianchun Ye, Ming Liu (2013). Correction to "Investigation of charge loss mechanism of thickness-scalable trapping layer by variable temperature Kelvin probe force microscopy" [Jul 13 870-872]. IEEE Electron Device Letters.DOI
Weichun Luo, Hong Yang, Wenwu Wang, Hao Xu, Shangqing Ren, Bo Tang, Zhaoyun Tang, Jing Liang Xu, Yan Li Jiang, Chao Zhao, Dapeng Chen, Tianchun Ye (2013). Channel Hot-Carrier degradation characteristics and trap activities of high-k/metal gate nMOSFETs. IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).DOI
Qidong Wang, Daniel Guidotti, Liqiang Cao, Jie Cui, Lixi Wan, Tianchun Ye (2013). High Bandwidth Silicon Millimeter Waveguides. Microwave and Optical Technology Letters.DOI
Yulong Han, Zongliang Huo, Xinkai Li, Guoxing Chen, Xiaonan Yang, Dong Zhang, Yong Wang, Tianchun Ye, M. Liu (2013). Investigation of charge loss mechanism of thickness-scalable trapping layer by variable temperature Kelvin probe force microscopy. IEEE Electron Device Letters.DOI
Jian Hua Deng, Qingbo Liu, Chao Zhao, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Jun Luo (2013). A modified scheme to tune the Schottky Barrier Height of NiSi by means of dopant segregation technique. Vacuum.DOI
Yulong Han, Zongliang Huo, Xiaonan Yang, Xinkai Li, Guoxing Chen, Dong Xiang Zhang, Chenjie Wang, Ziyu Liu, Tianchun Ye, Ming Liu, Yuan Yao, Richeng Yu (2013). Visualization on charge distribution behavior in thickness-scalable HfO2 trapping layer by in-situ electron holography and Kelvin Probe Force Microscopy technology. IEEE International Memory Workshop (IMW).DOI
Jian Shi, Shimao Xiao, Yunfeng Yu, Wei Huang, Wenguang Pan, Tianchun Ye, Min Qian, Xiaofeng He, Chengyan Ma (2013). A 5.8GHz integrated CMOS transmitter for Chinese electronic toll collection system. IEEE International Symposium on Circuits and Systems proceedings.DOI
Qidong Wang, Daniel Guidotti, Jie Cui, Liqiang Cao, Tianchun Ye, Lixi Wan (2013). A highly integratable millimeter-wave silicon waveguide array for Terabit application. 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC).DOI
Shibing Long, Xiaojuan Lian, Tianchun Ye, C. Cagli, L. Perniola, Enrique A. Miranda, Ming Liu, Jordi Suñé (2013). Cycle-to-Cycle Intrinsic RESET Statistics in ${\rm HfO}_{2}$-Based Unipolar RRAM Devices. IEEE Electron Device Letters.DOI
Xiaolei Wang, Jinjuan Xiang, Wenwu Wang, Jing Zhang, Kai Han, Hong Yang, Xueli Ma, Chao Zhao, Dapeng Chen, Tianchun Ye (2013). A possible origin of core-level shift in SiO2/Si stacks. Applied Physics Letters.DOI
Xiaolei Wang, Jinjuan Xiang, Wenwu Wang, Jing Zhang, Kai Han, Hong Yang, Xueli Ma, Chao Zhao, Dapeng Chen, Tianchun Ye (2013). Reexamination of band offset transitivity employing oxide heterojunctions. Applied Physics Letters.DOI
Jian Shi, Taishan Mo, Chengyan Ma, Tianchun Ye (2013). A current-shaping technique for static MOS current-mode logic prescalers. IEICE Electronics Express.DOI
Yi Ou, Zhigang Li, Furong Qu, Kai Yang, Yu Liu, Dapeng Chen, Tianchun Ye (2013). Investigation on Performance and Vacuum Package of MEMS Infrared Focal Plane Arrays. IEEE Electron Device Letters.DOI
Jin-Juan Xiang, Xiao-Lei Wang, Ting-Ting Li, Chao Zhao, Wen-Wu Wang, Jun-Feng Li, Q. Liang, Da-Peng Chen, Tianchun Ye (2013). Band Lineup Issues Related with High-k/SiO2/Si Stack.DOI
Xue-Li Ma, Xiao-Lei Wang, Kai Han, Wen-Wu Wang, Hong Yang, Chao Zhao, Da-Peng Chen, Tianchun Ye (2013). Remote Scavenging Technology using Ti/TiN Capping Layer Interposed in a Metal/High-k Gate Stack.DOI
Jun Luo, Zhi-Jun Qiu, Jian Deng, Chao Zhao, Jun-Feng Li, Wen-Wu Wang, Da-Peng Chen, Dongping Wu, Michael Östling, Tianchun Ye, Shi-Li Zhang (2013). Effects of Prior Carbon Ion Implant in Si substrate on Ni silicidation.
Xue-Li Ma, Xiao-Lei Wang, Kai Han, Wen-Wu Wang, Hong Yang, Chao Zhao, Da-Peng Chen, Tianchun Ye (2013). Electrical Properties and Interfacial Structures of High-k/Metal Gate MOSCAP Using Ti/TiN Scavenging Stack between High-κ Dielectric and Metal Gate.DOI
Shang-Qing Ren, Hong Yang, Wen-Wu Wang, Hao Xu, Wei-Chun Luo, Bo Tang, Zhao-Yun Tang, Jing Xu, Jiang Yan, Chao Zhao, Tianchun Ye (2013). Negative Bias Temperature Instability Characteristics and Degradation Mechanisms of pMOSFET with High-k/Metal Gate Stacks.DOI
Miao Xu, Hui-Long Zhu, Wu Hao, Q. Liang, Haizhou Yin, Dapeng Cheng, Tianchun Ye (2013). Simulations of Bulk FinFETs with Body Gate Controlling Punch through Leakage.DOI
Kai Han, Xiao-Lei Wang, Wen-Wu Wang, Jing Zhang, Jin-Juan Xiang, Hong Yang, Zhao Chao, Da-Peng Chen, Tianchun Ye (2013). Schottky Barrier Height at TiN/HfO2 Interface of TiN/HfO2/SiO2/Si Structure.DOI
Hao Xu, Hong Yang, Shang-Qing Ren, Wei-Chun Luo, Yan-Rong Wang, Kai Han, Jin-Juan Xiang, Xiao-Lei Wang, Xue-Li Ma, Wen-Wu Wang, Chao Zhao, Da-Peng Chen, Tianchun Ye (2013). Electrical and TDDB Characteristics of High-k/Metal Gate MOS Capacitors with Different RTO Temperatures.DOI
X. Tong, Q. Liang, H. Zhong, Hui-Long Zhu, Da-Peng Chen, Tianchun Ye (2013). On the design of 2-port SRAM memory cells using PNPN diodes for VLSI application.
Jiao Chen, Zhi Hao Jin, Peng Ma, Hong Wang, Haomin Wang, Jingyuan Shi, Songang Peng, Xinyu Liu, Tianchun Ye (2012). Depressed scattering across grain boundaries in single crystal graphene. Applied Physics Letters.DOI
Jian Hua Deng, Jun Luo, Chao Zhao, Junfeng Li, Wenwu Wang, Dapeng Chen, Tianchun Ye, Hanming Wu (2012). A more CMOS process compatible scheme to tune the Schottky Barrier Height of NiSi to electrons by means of dopant segregation (DS) technique. IEEE International Conference on Solid-State and Integrated Circuit Technology.DOI
Wenbiao Ruan, Lan Chen, Tianyu Ma, Jingjing Fang, He Zhang, Tianchun Ye (2012). Optimization of a Cu CMP process modeling parameters of nanometer integrated circuits. Journal of Semiconductors.DOI
Jian Shi, Taishan Mo, Jianlian Le, Yebing Gan, Chengyan Ma, Tianchun Ye (2012). A high-efficiency, low-noise power solution for a dual-channel GNSS RF receiver. Journal of Semiconductors.DOI
Peng Ma, Zhi Hao Jin, Jian-Nan Guo, Hongliang Pan, Xinyu Liu, Tianchun Ye, Yuping Jia, Liwei Guo, Xiaolong Chen (2012). Top-gated graphene field-effect transistors on SiC substrates. Chinese Science Bulletin.DOI
Guang Zhu, Daniel Guidotti, Fujiang Lin, Qidong Wang, Jie Cui, Qian Wang, Liqiang Cao, Tianchun Ye, Lixi Wan (2012). Millimeter wave interchip communication.DOI
Peng Ma, Zhi Hao Jin, Jian-Nan Guo, Hongliang Pan, Xinyu Liu, Tianchun Ye, Hong Wang, Guanzhong Wang (2012). Chemical Vapour Deposition Graphene Radio-Frequency Field-Effect Transistors. Chinese Physics Letters.DOI
Jinjuan Xiang, Xiaolei Wang, Tingting Li, Chao Feng Zhao, Wenwu Wang, Junfeng Li, Dapeng Chen, Tianchun Ye (2012). Band alignment of high-k dielectric on SiO2/Si stack. International Workshop on Junction Technology.DOI
Xuan Xiong Zhang, Yi Ou, Fan Yang, Tianchun Ye, Song Lin Zhuang (2012). The study on the micro-voids of InP/Si and InP/SiO2 wafer bonding by infrared transmission and scanning acoustic microscopy. IEEE International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D).DOI
Xiaolei Wang, Wenwu Wang, Kai Han, Hong Yang, Jing Zhang, Xueli Ma, Jinjuan Xiang, Chao Zhao, Dapeng Chen, Tianchun Ye (2012). Investigation of band structure at metal-gate/high-k interface of metal oxide semiconductor device with high-k and metal gate stack. International Workshop on Junction Technology.DOI
Qingqing Liang, Qiuxia Xu, Huilong Zhu, Huicai Zhong, Junfeng Li, Chao Zhao, Dapeng Chen, Tianchun Ye (2012). Interfacial Elastic Dipoles: A New EOT Shifting Mechanism in HKMG Devices. IEEE Electron Device Letters.DOI
Xizhen Yin, Shimao Xiao, Yuhua Jin, Qiwu Wu, Chengyan Ma, Tianchun Ye (2012). A constant loop bandwidth fractional-Nfrequency synthesizer for GNSS receivers. Journal of Semiconductors.DOI
X. L. Wang, W. W. Wang, Kai Han, Jing Zhang, J. J. Xiang, X. L., Hao Yang, Dalong Chen, Tianchun Ye (2012). Systematical investigation and physical mechanism of HfO2 gate stacks band alignment, VFB shift and Fermi level pinning.DOI
Xiaolei Wang, Kai Han, Wenwu Wang, Jinjuan Xiang, Hong Yang, Jing Zhang, Xueli Ma, Chao Zhao, Dapeng Chen, Tianchun Ye (2012). Band alignment of HfO2 on SiO2/Si structure. Applied Physics Letters.DOI
Hao Wu, Miao Xu, Weiping Xiao, Binneng Wu, Huilong Zhu, Qingqing Liang, Lichuan Zhao, Huicai Zhong, Zhijiong Luo, Haizhou Yin, H.Y. Yu, Dapeng Cheng, Tianchun Ye (2012). A Simulation Study of Substrate Dopant Engineering for Extremely Thin SOI (ET-SOI) MOSFETs with Ultra Thin BOX (UT-BOX). ECS Transactions.DOI
Xiaolei Wang, Kai Han, Wenwu Wang, Hong Yang, Jing Zhang, Xueli Ma, Jinjuan Xiang, Dapeng Chen, Tianchun Ye (2012). Band alignment of TiN/HfO2 interface of TiN/HfO2/SiO2/Si stack. Applied Physics Letters.DOI
Lingkuan Meng, Huaxiang Yin, Dapeng Chen, Tianchun Ye (2012). Metal gate etch-back planarization technology. Journal of Semiconductors.DOI
Xiaolong Ma, Huaxiang Yin, Zuozhen Fu, Haiqiang Zhang, Xu Zhang, Jiang Yan, Chao Feng Zhao, Dapeng Chen, Tianchun Ye (2012). Diamond-Like Carbon Thin Films with Extremely High Compressive Stress (>8~12GPa) for Advanced CMOS Strain Engineering. MRS Proceedings.DOI
Tianchun Ye (2012). Analysis and Design of Low Noise Amplifier with ESD Protection.
X. Tong, Q. Liang, H. Zhong, Hui-Long Zhu, Da-Peng Chen, Tianchun Ye (2012). A New SRAM Cell Using the Optimized PNPN Diode.DOI
Ruiwen Liu, Bin-Bin Jiao, Da-Peng Chen, Tianchun Ye (2012). Method and structure for encapsulating transparent substrate detector chip.
Xiao-Lei Wang, Wen-Wu Wang, Kai Han, Jing Zhang, Jin-Juan Xiang, Xue-Li Ma, Hong Yang, Da-Peng Chen, Tianchun Ye (2012). Comprehensive Demonstration and Physical Origin of HfO2 Gate Stacks: Band Alignment, VFB Shift and Fermi Level Pinning.DOI
Zhang-Liang Qin, Tianchun Ye, Hua-Xiang Yin (2012). Of the source / drain regions closer mos device and a method for manufacturing a channel region.
Xiao-Long Ma, Hua-Xiang Yin, Zuo-Zhen Fu, Xu Zhang, K. Du, Jiang Yan, Chao Zhao, Da-Peng Chen, Tianchun Ye (2012). Investigation of Tetrahedral Amorphous Carbon (ta-C) as Diffusion Barrier for Advanced Cu Metallization Technology.DOI
Hongliang Pan, Zhi Hao Jin, Peng Ma, Jian-Nan Guo, Xinyu Liu, Tianchun Ye, Jia Zhao Li, Shaobo Dun, Zhihong Feng (2011). Wafer-Scale Gigahertz Graphene Field Effect Transistors on SiC Substrates. Chinese Physics Letters.DOI
Chenluan Wang, Lu Huang, Nan Chen, Tianchun Ye, Fujiang Lin (2011). A 0.65 mW 2.3–2.5GHz low phase noise LC-VCO with adaptive body biasing technique. IEEE International Symposium on Radio-Frequency Integration Technology (RFIT).DOI
Fan Yang, Xuan Xiong Zhang, Tianchun Ye, Song Lin Zhuang (2011). The surface blistering kinetics and the H-platelet evolution in H-implanted germanium. Physica B Condensed Matter.DOI
Wenbiao Ruan, Lan Chen, Zhigang Li, Tianchun Ye, Tianyu Ma, Qiang Wang (2011). Effects of pattern characteristics on the copper electroplating process. Journal of Semiconductors.DOI
Miao Xu, Qingqing Liang, Huilong Zhu, Haizhou Yin, Zhijiong Luo, Dapeng Chen, Tianchun Ye (2011). Simulations of FDSOI CMOS with Sharing Contact between Source/Drain and Back Gate. ECS Transactions.DOI
Meng Li, Qingqing Liang, Huilong Zhu, Huicai Zhong, Dapeng Chen, Tianchun Ye (2011). Process Impact and Design Optimization on the Soft Yield of 25nm FinFET SRAM Cells. ECS Transactions.DOI
Yunfeng Yu, Tianchun Ye, Chengyan Ma (2011). Optimization and design of a novel prescaler and its application to GPS receivers. Science China Information Sciences.DOI
Weilong Li, Rui Jia, Chen Chen, Haofeng Li, Xinyu Liu, Huihui Yue, Wuchang Ding, Tianchun Ye, Seiya Kasai, Tamotsu Hashizume, Nan-Jian Wu Nan-Jian Wu, Bingshe Xu (2011). Formation of silicon nanocrystals embedded in high-κ dielectric HfO2 and their application for charge storage. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.DOI
Xiaofeng He, Taishan Mo, Chengyan Ma, Tianchun Ye (2011). A novel analog/digital reconfigurable automatic gain control with a novel DC offset cancellation circuit. Journal of Semiconductors.DOI
Fan Yang, Xuan Xiong Zhang, Tianchun Ye, Song Lin Zhuang (2011). The Investigation on Surface Blistering of Ge Implanted by Hydrogen under the Low Temperature Annealing. Journal of The Electrochemical Society.DOI
Y. Ou, Wen-Wu Wang, Da-Peng Chen, Tianchun Ye (2011). Suspension structure micro-electro-mechanical-systems (MEMS) device and manufacturing method thereof.
Q. Liang, Qiang Xu, Gao-Bo Xu, H. Zhong, Hui-Long Zhu, Jian-Feng Li, Chao Zhao, Jiang Yan, Da-Peng Chen, Tianchun Ye (2011). A new EOT shrinking mechanism in TiN/HfLaON HKMG MOSFET: Experimental and ab-initio study. International Semiconductor Device Research Symposium.DOI
Sha-Li Shi, Da-Peng Chen, Yu-Peng Jing, Y. Ou, Tianchun Ye, Qiu-Xia Xu (2010). A novel method for sacrificial layer release in MEMS devices fabrication.DOI
Jian Xin Shen, Xuan Xiong Zhang, Tianchun Ye, Songlin Zhuang (2010). Ge/SiO2 low temperature wafer bonding. IEEE International Conference on Solid-State and Integrated Circuit Technology.DOI
Zhou Junxiong, Lan Chen, Wenbiao Ruan, Zhigang Li, Weixiang Shen, Tianchun Ye (2010). Dummy fill effect on CMP planarity. Journal of Semiconductors.DOI
Xuanxiong Zhang, Tianchun Ye, Songlin Zhuang, Jiwei Jiao (2010). The Characteristics of Interface Microstructures in Germanium/SiO2 Low Temperature Wafer Bonding. ECS Transactions.DOI
Chen Pufeng, Zhiqiang Li, Wang Xiaosong, Zhang Haiying, Tianchun Ye (2010). A 6–9 GHz 5-band CMOS synthesizer for MB-OFDM UWB. Journal of Semiconductors.DOI
Yunfeng Yu, Yue Jian-lian, Xiao Shimao, Haixiao Zhuang, Chengyan Ma, Tianchun Ye (2010). A low-power CMOS frequency synthesizer for GPS receivers. Journal of Semiconductors.DOI
Chen Pufeng, Zhang Haiying, Tianchun Ye (2010). A 1.5 V 7.656 GHz PLL with I/Q outputs for a UWB synthesizer. Journal of Semiconductors.DOI
Shi Sha-Li, Dapeng Chen, Yi Ou, Yupeng Jing, Xu Qiuxia, Tianchun Ye (2010). A novel anti-shock silicon etching apparatus for solving diaphragm release problems. Chinese Physics B.DOI
Jianyu Fu, Dapeng Chen, Tianchun Ye (2010). Study on electrothermally actuated cantilever array for nanolithography. Science China Technological Sciences.DOI
Xiao Shimao, Yunfeng Yu, Chengyan Ma, Tianchun Ye, Ming Qiang Yin (2010). A low power wide-band CMOS PLL frequency synthesizer for portable hybrid GNSS receiver. Journal of Semiconductors.DOI
Tianchun Ye (2010). A Mis-matching Tolerant Zero-IF Mixer for GPS Application.
Tianchun Ye (2010). A Low Power Complex Filter Design with Automatic Frequency Tuning.
Tianchun Ye (2010). High Power Class D Audio Amplifier with Low THD+N.
Xiao Shimao, Chengyan Ma, Tianchun Ye (2010). Design of Low Power Wide Band CMOS LC-VCO. Research & Progress of SSE Solid State Electronics.
Wei Huang, MA Cheng-yan, Tianchun Ye (2010). Successive Approximation A/D Converter for Wireless Sensor Network SoC.
Tianchun Ye (2010). Design of Wideband Complex Filter for RF Front End.
Xu Yan, Dong-Mei Li, Ming Liu, Tianchun Ye (2010). A new saw device with tellurium sensing film for NO2 detection.DOI
Yuping Wu, Lan Chen, Tianchun Ye (2009). Parallel on Analog Circuit Synthesis.DOI
Chen Chen, Rui Jia, Weilong Li, Haofeng Li, Tianchun Ye, Xinyu Liu, Ming Liu, Seiya Kasai, Hashizume Tamotsu, Nan-Jian Wu Nan-Jian Wu (2009). Enhanced charge storage characteristics of silicon nanocrystals fabricated by electron-beam coevaporation of Si and SiOx(x=1 or 2). Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.DOI
Xiao Shimao, Chengyan Ma, Tianchun Ye (2009). A novel 2.95–3.65 GHz CMOS LC-VCO using tuning curve compensation. Journal of Semiconductors.DOI
Kai Yang, Zhigang Li, Yupeng Jing, Dapeng Chen, Tianchun Ye (2009). A simple prediction method for composite rectangular microcantilevers with equal width and the dimensional optimization. Microelectronics Journal.DOI
Chen Chen, Rui Jia, Ming Liu, Weilong Li, Chenxin Zhu, Haofeng Li, Peiwen Zhang, Changqing Xie, Qin Lin Wang, Tianchun Ye (2009). Silicon nanocrystals synthesized by electron-beam co-evaporation method and their application for nonvolatile memory. Thin Solid Films.DOI
Wenbiao Ruan, Lan Chen, Zhigang Li, Tianchun Ye (2009). Effects of pattern characteristics on copper CMP. Journal of Semiconductors.DOI
Weilong Li, Rui Jia, Ming Liu, Chen Chen, Changqing Xie, Zhu Chen-Xin, Haofeng Li, Zhang Pei-Wen, Tianchun Ye (2009). Fabrication and Characterization of Si Nanocrystals Synthesized by Electron Beam Evaporation of Si and SiO 2 Mixture. Chinese Physics Letters.DOI
Yunfeng Yu, Xin Meng, Shimao Xiao, Chengyan Ma, Tianchun Ye (2009). A new low-cost demodulator for 2.4 GHz ZigBee receivers. Journal of Electronics (China).DOI
Kai Yang, Zhigang Li, Yupeng Jing, Dapeng Chen, Tianchun Ye (2009). Research on the resonant frequency formula of V-shaped cantilevers. IEEE International Conference on Nano/Micro Engineered and Molecular Systems.DOI
Tianchun Ye (2009). Design of a Wideband and Low Phase Noise CMOS LC VCO. Research & Progress of SSE Solid State Electronics.
Xia Zhang, Binbin Jiao, Dapeng Chen, Tianchun Ye (2009). The optimizing designing of bi-material micro cantilever with adhesive layer in between and its application in an uncooled MEMS IR FPA. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.DOI
Tianchun Ye (2009). Fabrication of High Aspect-ratio Hard X-Ray Zone Plates with Supporting Structures.
Qiuxia Xu, Gaobo Xu, Wenwu Wang, Dapeng Chen, Shali Shi, Zhengsheng Han, Tianchun Ye (2008). Study on characteristics of thermally stable HfLaON gate dielectric with TaN metal gate. Applied Physics Letters.DOI
Jianyu Fu, Dapeng Chen, Tianchun Ye, Binbin Jiao, Yi Ou (2008). Modeling and optimal design of multilayer thermal cantilever microactuators. Science China Technological Sciences.DOI
JingBo Xu, Haiying Zhang, Wenxin Wang, Liang Liu, Ming Li, Fu Xiaojun, Jiebin Niu, Tianchun Ye (2008). 200 nm gate-length GaAs-based MHEMT devices by electron beam lithography. 《中国科学通报:英文版》.DOI
Shali Shi, Liang Yi, Dapeng Chen, Yi Ou, Yupeng Jing, Tianchun Ye, Zhongyu Cheng (2008). Two microthermal shear stress sensors: surface micromachined and bulk-bonding micromachined. Journal of Micro/Nanopatterning Materials and Metrology.DOI
Daming Gao, Wuchen Wu, Qing Ye, Tianchun Ye (2008). Research on the Genetic Algorithms applied to evolvement analog IC. International Conference on Solid-State and Integrated Circuit Technology (ICSICT).DOI
Qin Wang, Rui Jia, Weihua Guan, Weilong Li, Qi Liu, Y. Hu, Shibing Long, Baoqin Chen, Ming Liu, Tianchun Ye, Wensheng Lü, Long Jiang (2008). Comparison of discrete-storage nonvolatile memories: advantage of hybrid method for fabrication of Au nanocrystal nonvolatile memory. Journal of Physics D Applied Physics.DOI
Tianchun Ye (2008). Design of a 2.4 GHz CMOS Low Noise Amplifier.
Tianchun Ye (2008). Design of a Low-Noise and High-Gain CMOS Down-Conversion Mixer.
Yi-Rong Liang, Ou Yi, Sha-Li Shi, Ma Jin, Da-Peng Chen, Tianchun Ye (2008). Micro thermal shear stress sensor based on vacuum anodic bonding and bulk-micromachining.DOI
Shouguo Wang, Xiangyu Xu, Lingli Zhao, Tianchun Ye (2007). Photoresist Etching by Atmospheric Pressure Uniform-Glow Plasma. Japanese Journal of Applied Physics.DOI
Q. Wang, Rui Jia, W.L. Li, W.H. Guan, Qingyu Liu, Yixuan Hu, Shibing Long, Bo-you Chen, M. Liu, Tianchun Ye, Wei Lü, Lei Jiang (2007). A hybrid method for fabrication of Au nanocrystals nonvolatile memory. IEEE Conference on Nanotechnology (IEEE NANO).DOI
Qiuxia Xu, Xiaofeng F. Duan, Haihua Liu, Zhengsheng Han, Tianchun Ye (2007). Low-Cost and Highly Manufacturable Strained-Si Channel Technique for Strong Hole Mobility Enhancement on 35-nm Gate Length pMOSFETs. IEEE Transactions on Electron Devices.DOI
Xiangyu Xu, Li Li, Shouguo Wang, Lingli Zhao, Tianchun Ye (2007). Deposition of SiOxfilms with a capacitively-coupled plasma at atmospheric pressure. Plasma Sources Science and Technology.DOI
Qiuhong Wang, Y. F. Chen, Shibing Long, J.B. Niu, Chenxi Wang, Rui Jia, B.Q. Chen, M. Liu, Tianchun Ye (2007). Fabrication and characterization of single electron transistor on SOI. Microelectronic Engineering.DOI
Tianchun Ye (2007). A 4.2 GHz 1.8 V CMOS LC VCO. Research & Progress of SSE Solid State Electronics.
Yunfeng Wang, Qing Ye, Jiahan Man, Jun Fan, Tianchun Ye (2007). Design a 4GHz PLL for wireless receiver. International Conference on ASIC.DOI
Chaobo Li, Binbin Jiao, Shali Shi, Tianchun Ye, Dapeng Chen, Qingchuan Zhang, Zheying Guo, Fengliang Dong, Xiaoping Wu (2007). A novel MEMS-based focal plane array for infrared imaging. Frontiers of Electrical and Electronic Engineering in China.DOI
Tianchun Ye (2007). Electrostatic RF MEMS Switches Based on Mono Crystal Silicon Cantilever Structure. Equipment for Electronic Products Manufacturing.
Xiao-Li Zhu, Jie Ma, Leifeng Cao, Jia-Min Yang, Chang-Qing Xie, Ming Liu, Bao-Qin Chen, Jiebin Niu, Qing-Zhao Zhang, Ji Jiang, Min Zhao, Tianchun Ye (2007). Fabrication of High-Density Transmission Gratings for X-Ray Diffraction.
Jing-Bo Xu, Hai-Ying Zhang, Jun-Jian Yin, Liang Liu, Xiao Li, Tianchun Ye, Ming Li (2007). Monolithic Integration of 0.8μm Gate-Length GaAs-Based InGaP/AlGaAs/InGaAs Enhancement- and Depletion-Mode PHEMTs.
Tianchun Ye, Yu-Peng Jing, Y. Ou, Sha-Li Shi, Da-Peng Chen (2007). Anti-current-rush bulk silicon etching equipment.
Tianchun Ye, Yu-Peng Jing, Da-Peng Chen (2007). Manufacturing method of micro-electro-mechanism system magnetic executor based on overhead metal wire bridge.
Xiao Li, Hai-Ying Zhang, Jun-Jian Yin, Liang Liu, Jing-Bo Xu, Ming Li, Tianchun Ye, Min Gong (2007). Research of breakdown characteristic of InP composite channel HEMT.DOI
Hua Huang, Haiying Zhang, Jun-jian Yin, Tianchun Ye (2006). Enhancement Mode pHEMT LNA with Super Low Noise and High Gain for S Band Application. International Conference on Solid-State and Integrated Circuit Technology (ICSICT).DOI
Shali Shi, Dapeng Chen, Honglei Bai, Deyong Ding, Yi Ou, Tianchun Ye, Gongxin Shen (2006). A Novel Micro Thermal Shear Stress Sensor with a Cavity underneath. IEEE International Conference on Nano/Micro Engineered and Molecular Systems.DOI
Tianchun Ye (2006). A Flash Module for Analog-to-Digital Converters.
Tianchun Ye (2006). An Overview of Architecture Design of Frequency Synthesizers for Wireless Applications.
Tianchun Ye (2006). Simulation and Analysis on Characteristics of Single Electron Transistor. Research & Progress of SSE Solid State Electronics.
Tianchun Ye (2006). Thin Film Making Technology in MEMS.
Tianchun Ye (2006). Physics-Based Hydrodynamic Simulation of Direct Current Characteristics in DBRTD.
Chang-Qing Xie, Tianchun Ye (2006). Manufacture method of high resolution self-supporting totally hollowed-out transmission grating.
Xiao Li, Liang Liu, Hai-Ying Zhang, Jun-Jian Yin, Hai'ou Li, Tianchun Ye, Min Gong (2006). A new small signal physical model of InP-based composite channel high electron mobility transistor.DOI
Tianchun Ye (2006). Ohmic Contact to n-Type GaAs by a New Six-Layer Metal System.
Kun Zhao, Jia-Han Man, Qing Ye, Tianchun Ye (2005). A fully integrated 1.2-GHz CMOS phase-locked loop. International Conference on ASIC.DOI
Jia-Xing Sun, Tianchun Ye, Shanqin Qiu (2005). Interconnect delay and slew computation with the first three moments. International Conference on ASIC.DOI
Kazunari Ozasa, Eun Kyu Kim, Tianchun Ye, Y. Aoyagi (2005). Selective Epitaxy With In Situ Mask Processing. Proceedings of IEE/LEOS Summer Topical Meetings: Integrated Optoelectronics.DOI
Jiaxing Sun, Yun Zheng, Qing Ye, Tianchun Ye (2005). Interconnect Delay and Slew Metrics Using the First Three Moments. International Symposium on Quality of Electronic Design (ISQED).DOI
Jiaxing Sun, Yun Zheng, Qing Ye, Tianchun Ye (2005). Worst-case crosstalk noise analysis based on dual-exponential noise metrics. International Conference on VLSI Design and International Conference on Embedded Systems (VLSID).DOI
Tianchun Ye (2005). Study on Image Datum for High Resolution Zone Plates Fabricated by E-beam.
Haijiang Li, Shouguo Wang, Zhao Lingli, Tianchun Ye (2004). Study on an Atmospheric Pressure Plasma Jet and its Application in Etching Photo-Resistant Materials. Plasma Science and Technology.DOI
Iuxia Xu, He Ian, Ming Liu, Zhengsheng Man, Baoqing Chen, Huaxiang Yin, Gang Lin, Yajiang Zhu, Tianchun Ye, Denxin Wu (2004). High performance 27 nm gate length CMOS device with EOT 1.4 nm gate oxynitride and strained technology. International Conference on Solid-State and Integrated Circuits Technology.DOI
Yu-Zhen Liu, Yuqin Zhou, Wan-Liang Shi, Ling-Li Zhao, Baoyin Sun, Tianchun Ye (2004). Study of photoluminescence spectra of Si-rich SiNx films.DOI
Tianchun Ye, Ye Xunchun, Xiaoming Li (2002). Plasma etching damage to InGaAs/InP 2DEG material.DOI
Liu Ming, Baoqin Chen, Tianchun Ye, He Qian, Xu Qiuxia (2002). The sub-micron fabrication technology. International Conference on Solid-State and Integrated Circuit Technology (ICSICT).DOI
Xun-Chun Li, Meng-Zhen Chen, Tianchun Ye, Yu-Ling Wang, Baoyin Sun, Run-Mei Wang, Chang-Qing Xie, Zhengya Cao, Zhangzhen Zhu (1995). Metal side-wall pattern with a supporter for X-ray mask. Proceedings of 4th International Conference on Solid-State and IC Technology.DOI
K. Ozasa, Tianchun Ye, Y. Aoyagi (1994). Deposition of thin indium oxide film and its application to selective epitaxy for in situ processing.DOI
K. Ozasa, Tianchun Ye, Y. Aoyagi (1994). Deposition of gallium oxide and indium oxide on GaAs for in situ process use by alternating supply of TEGa, TMIn, and H2O2 as surge pulses.DOI
K. Ozasa, Tianchun Ye, Y. Aoyagi (1993). Thin Gallium Oxide Film Deposited in Vacuum for In Situ Process Use.DOI
K. Ozasa, Tianchun Ye, Y. Aoyagi (1993). Selective epitaxy of GaAs on indium oxide mask followed by in situ removal of the mask.DOI
K. Ozasa, Tianchun Ye, Y. Aoyagi (1993). Composition Change of Indium Oxide Film by Triethylgallium Irradiation Prepared for In Situ Selective Epitaxy Use.DOI
Xiao-Feng He, Tai-Shan Mo, Cheng-Yan Ma, Tianchun Ye. Using a Wideband Digital Gain Control Amplifier with Linearity Improvement Technique for a Digital TV Tuner.
预印本
Y Zhang, Zhou Wang, Zhou Shu, Jiuren Zhou, Yanqing Xu, Xiaonan Tang, Shushan Qiao, Tianchun Ye, Yang Liu, Anil A. Bharath, Emm Mic Drakakis (2026). DSPE: An Energy-Efficient Edge Processor for DeepSeek Inference with MerkleTree-based Incremental Pruning, Multi-Stage Boothing Lookup and Dynamic Adaptive Posit Processing. arXiv (Cornell University).DOI
Yayi Wei, Dandan Han, Tianchun Ye, Sen Deng (2022). Enhancement of pattern quality with loss modulation: Applying plasmonic lithography in sub-20 nm technology node and beyond. Research Square.DOI
fei zhao, Yongliang Li, jiayi zhang, xiaofeng jia, anlan chen, Xiaohong Cheng, Yongqin Wu, Huaxiang Yin, kai zheng, Jun Luo, Weihai Bu, Jin Ung Kang, wenwu wang, Tianchun Ye (2022). Novel Stacked Sige/Si Finfet Device with Subthreshold Swing of 68mv/Dec Using Optimized Thermal Budget and Channel Passivation Technology. SSRN Electronic Journal.DOI
书籍章节
Tianchun Ye, Dapeng Chen, Shali Shi, Binbin Jiao (2018). Silicon-Based Optical Sensor: Uncooled Infrared Focal Plane Array Based on Bi-Materials Cantilever Microstructures. Micro/Nano technologies.DOI
Tianchun Ye, Dapeng Chen, Shali Shi, Binbin Jiao (2017). Silicon Based Optical Sensor: Uncooled Infrared Focal Plane Array Based on Bi-Materials Cantilever Microstructures. Toxinology.DOI