Bowen Sun, Y. Guan, Shanghu Shi, Sikun Li (2026). Simulation of EUV mask defect classification based on optical neural network. Optical Systems Design.DOI
Han-Zhi Zhang, Sikun Li, Xiaowei Song, Jing-Quan Lin (2026). Three-dimensional absorber correction for EUV mask defect compensation. Optics Express.DOI
Meng Chen, Sikun Li (2026). Vector Diffraction Modeling and Parametric Study of 266 nm Sub-wavelength Pinholes for High-NA Wavefront Sensing. Applied Optics.DOI
Yong-Liang Xiao, Sikun Li, Zhi-Sheng You (2026). Normal-height ambiguity elimination with reflection law in fringe-reflection stereo deflectometry. International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT).DOI
Zhi-Lin Wen, Jing-Quan Lin, Sikun Li (2025). Spectral performance optimization in Gd-based BEUV sources via cavity-confined targets: parametric study on cavity geometry. The International Conference on Optical Engineering, Sensing and Instruments.DOI
Han-Zhi Zhang, Sikun Li, Xiao-Wei Song, Jing-Quan Lin (2025). High-efficiency EUV mask defect compensation method based on the pixelated absorber layer correction. Optics Express.DOI
Jia-Hong Liu, Jing-Pei Hu, Sikun Li, Huijie Huang(2025). 自由光瞳整形模块中的消相干微透镜阵列设计方法. Chinese Journal of Lasers.DOI
Jia-Hong Liu, Fang Zhang, Pei Zhang, Sikun Li, Hui-Jie Huang (2024). Random Phase Plate Designed by Genetic Algorithm for Decoherence in Energy Homogenization Units of Photolithography Illumination System. Applied Optics.DOI
Hang Zheng, Sikun Li, W. Cheng, Shuai Yuan, Xiang-Zhao Wang (2023). Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography. Applied Optics.DOI
Longqaio Zhang, Sikun Li, Hang Zheng, Shuai Yuan, Xiang-Zhao Wang (2023). Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images. Other Conferences.DOI
Zhi-Yuan Niu, Sikun Li, Yang Liu (2023). Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools. Applied Optics.DOI
T. Tong, Dong-Chao Pan, Yi-Peng Jiang, Xiang-Zhao Wang, Sikun Li (2023). An Optimization Method To Improve Accuracy of the Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Images. 2023 International Workshop on Advanced Patterning Solutions (IWAPS).DOI
Yang Liu, Feng Tang, Sikun Li, Xiang-Zhao Wang (2023). Effects and elimination of image grating defocusing on a double-Ronchi shearing interference field. Applied Optics.DOI
Zheng Hang, Sikun Li, Dongchao Pang, Long Zhang, Shuai Yuan, Xiang-Zhao Wang (2023). Multilayer defect compensation based on three dimensional absorber correction in EUV lithography. Other Conferences.DOI
Yong-Liang Xiao, Zhi-Gang Zhang, Sikun Li, Jian-Xin Zhong (2023). Optical micro-phase-shift dropvolume in a diffractive deep neural network. Optics Letters.DOI
Tao Zhang, Hengyu Zhou, Sikun Li, S. Xiong, Xiang-Zhao Wang (2022). A Generation solving Layout Decomposition Method for DSA-MP Hybrid Lithography. 2022 International Workshop on Advanced Patterning Solutions (IWAPS).DOI
Yong-Liang Xiao, Sikun Li, G. Situ, Jian-Xin Zhong (2022). Optical random micro-phase-shift DropConnect in a diffractive deep neural network. Optics Letters.DOI
Hengyu Zhou, Tao Zhang, Sikun Li, Ming Tang, S. Xiong, Xiang-Zhao Wang (2022). A Via/Contact Layout Decomposition Method for Directed Self-Assembly Based on Local Optimization. 2022 International Workshop on Advanced Patterning Solutions (IWAPS).DOI
Yang Liu, Feng Tang, Sikun Li, Xiang-Zhao Wang, Rong Su (2022). Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field. Applied Optics.DOI
Lu-Feng Liao, Sikun Li, Yongqiang Che, Wei-Jie Shi, Xiang-Zhao Wang (2022). Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network. Applied Sciences.DOI
Shaobo Hu, Zi-Nan Zhang, Sikun Li, M. Tang, Yue-Jing Qi, Xiang-Zhao Wang (2021). A fast mask diffraction model towards rigorous simulation in terms of accuracy. 2021 International Workshop on Advanced Patterning Solutions (IWAPS).DOI
Zi-Nan Zhang, Sikun Li, Xiang-Zhao Wang, Wei Cheng, Yu-qiang Qi (2021). Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm. Optics Express.DOI
Fang Wu, Yang Bu, Zhi-Fan Liu, Shaoqing Wang, Sikun Li, Xiang-Zhao Wang (2021). Design and analysis of bilayer metallic grating polarizer in deep ultraviolet band. Acta Physica Sinica.DOI
Yuguang Chen, Sikun Li, Jian-Fang He, Li-Bin Zhang, Wei-Jie Shi, M. Tang, Yayi Wei, Xiang-Zhao Wang (2021). A Scanner Matching Method based on Interior-point BFGS Algorithm. 2021 International Workshop on Advanced Patterning Solutions (IWAPS).DOI
Yong-Liang Xiao, Sikun Li, G. Situ, Zhisheng You (2021). Unitary learning for diffractive deep neural network. Optics and lasers in engineering.DOI
Zi-Nan Zhang, Sikun Li, Xiang-Zhao Wang, Wei Cheng (2021). Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling. Optics Express.DOI
Wei Cheng, Sikun Li, Xiang-Zhao Wang, Zi-Nan Zhang (2021). Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images. Applied Optics.DOI
Yuguang Chen, Sikun Li, Shaobo Hu, Guo-Dong Chen, Ming Tang, Wei-Jie Shi, Xiang-Zhao Wang (2021). A scanner matching method based on covariance matrix adaptation evolution strategy. Other Conferences.DOI
Zi-Nan Zhang, Sikun Li, Xiang-Zhao Wang, Wei Cheng (2021). Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall. Applied Optics.DOI
Guo-Dong Chen, Sikun Li, Xiang-Zhao Wang (2021). Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling. Optics Express.DOI
Lu-Feng Liao, Sikun Li, Xiang-Zhao Wang, Li-Bin Zhang, Peng-Zheng Gao, Yayi Wei, Wei-Jie Shi (2020). Critical pattern selection method for full-chip source and mask optimization. Optics Express.DOI
Lu-Feng Liao, Sikun Li, Xiang-Zhao Wang, Li-Bin Zhang, Shuang Zhang, Peng-Zheng Gao, Yayi Wei, Wei-Jie Shi (2020). Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization.DOI
Zi-Nan Zhang, Sikun Li, Xiang-Zhao Wang, Wei Cheng (2020). Fast rigorous mask model for extreme ultraviolet lithography. Applied Optics.DOI
Zhi-Fan Liu, Chao-Xing Yang, Yang Bu, Sikun Li, Jian-Hua Zhang, Xiang-Zhao Wang, Gang Sun (2020). Micromirror array allocation algorithm based on deconvolution. Applied Optics.DOI
Yong-Liang Xiao, Yong-Fu Wen, Sikun Li, Qican Zhang, Jian-Xin Zhong (2020). Large-scale structured light 3D shape measurement with reverse photography.DOI
Guo-Dong Chen, Sikun Li, Xiang-Zhao Wang (2020). Source mask optimization using the covariance matrix adaptation evolution strategy. Optics Express.DOI
Yan-Jie Mao, Sikun Li, Xiang-Zhao Wang, Ya-Yi Wei, Guo-Dong Chen (2020). Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model.DOI
Wei Cheng, Sikun Li, Xiang-Zhao Wang, Zi-Nan Zhang (2020). Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask.DOI
Yong-Liang Xiao, Sikun Li, Guo-Hai Situ, Zhisheng You (2020). Optical Phase Dropout in Diffractive Deep Neural Network. Optics Letters.DOI
Heng Zhang, Sikun Li, Xiang-Zhao Wang, Ze-Jiang Meng, Wei Cheng (2019). Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask.DOI
Yan-Jie Mao, Sikun Li, Xiang-Zhao Wang, Ya-Yi Wei (2019). Lithographic Tool-Matching Method Based on Differential Evolution Algorithm.DOI
Heng Zhang, Sikun Li, Xiang-Zhao Wang, Chaoxing Yang, Wei Cheng (2019). Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum). Journal of Edugeography.DOI
Yan-Jie Mao, Sikun Li, Gang Sun, L. Duan, Wei-Jie Shi, Yang Bu, Xiang-Zhao Wang (2019). Predictor of thermal aberrations via particle filter for online compensation. Journal of Edugeography.DOI
Ze-Jiang Meng, Sikun Li, Xiang-Zhao Wang, Bu Yang, F. Dai, Chao-Xing Yang (2019). Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter.DOI
Bo-Er Zhu, Sikun Li, Yan-Jie Mao, Xiang-Zhao Wang, Yang Bu, Jian Wang, Gang Sun, L. Duan (2019). Fast thermal aberration model for lithographic projection lenses. Optics Express.DOI
Bo-Er Zhu, Sikun Li, Xiang-Zhao Wang, Ze-Jiang Meng, Heng Zhang, F. Dai, Feng Tang, L. Duan (2019). High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix. Optics Communications.DOI
Ze-Jiang Meng, Sikun Li, Xiang-Zhao Wang, Yang Bu, Jian Wang, Shengliang Ni, Chaoxing Yang, Yan-Jie Mao (2019). Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources. Optics Express.DOI
Heng Zhang, Sikun Li, Xiang-Zhao Wang, Chao-Xing Yang, Wei Cheng (2018). Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy. Journal of Edugeography.DOI
Abel Kamagara, Xiang-Zhao Wang, Sikun Li (2018). Towards gamma-effect elimination in phase measurement profilometry. Optik (Stuttgart).DOI
Heng Zhang, Sikun Li, Xiang-Zhao Wang, Wei Cheng (2018). 3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration.DOI
Abel Kamagara, Xiang-Zhao Wang, Sikun Li, Changzhe Peng (2018). Digital sinusoidal fringe generation with defocusing for profilometry: exponential binary vs squared binary patterns. SPIE/COS Photonics Asia.DOI
Yong-Liang Xiao, Sikun Li, Qican Zhang, Jian-Xin Zhong, Xianyu Su, Zhisheng You (2018). Optical fringe-reflection deflectometry with bundle adjustment. Optics and lasers in engineering.DOI
Bo Zhu, Sikun Li, Xiang-Zhao Wang, F. Dai, Feng Tang, L. Duan (2018). High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations.DOI
Abel Kamagara, Xiang-Zhao Wang, Sikun Li (2018). Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology.DOI
Yan-Jie Mao, Sikun Li, Gang Sun, L. Duan, Yang Bu, Xiang-Zhao Wang (2018). Modeling and optimization of lens heating effect for lithographic projector.DOI
Abel Kamagara, Xiang-Zhao Wang, Sikun Li, Changzhe Peng (2018). Sparse and adaptive fringe-enhancement efficiency analysis in 3D optical digital fringe-projection imaging. International Conference on Digital Image Processing.DOI
Yan-Jie Mao, Sikun Li, Gang Sun, L. Duan, Wei-Jie Shi, Yang Bu, Xiang-Zhao Wang (2018). Prediction of lens heating induced aberration via particle filter in optical lithography. Advanced Lithography.DOI
Heng Zhang, Sikun Li, Xiang-Zhao Wang (2017). Fast Simulation Method of Extreme-Ultraviolet Lithography 3D Mask Based on Variable Separation Degration Method.DOI
Bo-Er Zhu, Xiang-Zhao Wang, Sikun Li, Ze-Jiang Meng, Heng Zhang, F. Dai, L. Duan (2017). High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens.DOI
Lei Wang, Sikun Li, Xiang-Zhao Wang, Chao-Xing Yang (2017). Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm.DOI
Yan-Jie Mao, Sikun Li, Gang Sun, Jian Wang, L. Duan, Yang Bu, Xiang-Zhao Wang (2017). The thermal aberration analysis of a lithography projection lens. Advanced Lithography.DOI
Yong-Liang Xiao, Sikun Li, Qican Zhang, Jian-Xin Zhong, Xianyu Su, Zhisheng You (2017). Optical fringe-reflection deflectometry with sparse representation.DOI
Abel Kamagara, Xiang-Zhao Wang, Sikun Li (2017). Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry. Applied Optics.DOI
Bo-Er Zhu, Xiang-Zhao Wang, Sikun Li, Guanyong Yan, Lina Shen, L. Duan (2016). Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image. Applied Optics.DOI
Lei Wang, Sikun Li, Xiang-Zhao Wang, Guanyong Yan, Chao-Xing Yang (2016). Pixelated source optimization for optical lithography via particle swarm optimization.DOI
Dong-Ying Xu, Sikun Li, Xiang-Zhao Wang, Kai-Wei Wang (2016). Wavelet Ridge Extraction Method Employing a Cost Function in Two- Dimensional Wavelet Transform Profilometry.DOI
Sikun Li, Xiang-Zhao Wang, Feng Tang, Yang Bu, Osami Sasaki (2016). Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry. Applied Optics.DOI
Chao-Xing Yang, Sikun Li, Xiang-Zhao Wang (2016). Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm.DOI
Chao-Xing Yang, Sikun Li, Xiang-Chao Wang (2016). Source Mask Optimization Based on Dynamic Fitness Function.DOI
Sikun Li, Xiang-Zhao Wang (2016). Radial period extraction method employing frequency measurement for quantitative collimation testing.DOI
Lei Wang, Sikun Li, Xiang-Zhao Wang, Chao-Xing Yang, Feng Tang (2016). Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography. Advanced Lithography.DOI
Lina Shen, Xiang-Zhao Wang, Sikun Li, Guanyong Yan, Bo-Er Zhu, Heng Zhang (2016). General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination. Journal of The Optical Society of America A-optics Image Science and Vision.DOI
Lina Shen, Sikun Li, Xiang-Zhao Wang, Guanyong Yan (2015). Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging.DOI
Lina Shen, Sikun Li, Xiang-Zhao Wang, Guanyong Yan (2015). Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality. Advanced Lithography.DOI
Xiao-Lei Liu, Sikun Li, Xiang-Zhao Wang, Heng Zhang (2015). Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography.DOI
Fei-Bin Wu, Feng Tang, Xiang-Zhao Wang, Jie Li, Sikun Li (2015). Study on Ronchi Shearing Interferometry for Wave-Front Aberration Measurement of Lithography Projection Lens.DOI
Jie Li, Feng Tang, Xiang-Zhao Wang, F. Dai, Peng Feng, Sikun Li (2015). Wavefront reconstruction for lateral shearing interferometry based on difference polynomial fitting.DOI
Lei Wang, Sikun Li, Xiang-Zhao Wang, Guanyong Yan, Chao-Xing Yang (2015). Source optimization using particle swarm optimization algorithm in photolithography. Advanced Lithography.DOI
Guanyong Yan, Sikun Li, Xiang-Zhao Wang (2014). Source Optimization Method of Lithography Tools Based on Quadratic Programming.DOI
Xiao-Lei Liu, Xiang-Zhao Wang, Sikun Li, Guanyong Yan, A. Erdmann (2014). Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography.DOI
Chao-Xing Yang, Sikun Li, Xiang-Zhao Wang (2014). Efficient source mask optimization using multipole source representation.DOI
Zhao-Ze Li, Sikun Li, Xiang-Chao Wang (2014). A method for joint optimization of the mask aligner light source.
Sikun Li, Xiang-Zhao Wang, Ji-Shuo Yang, L. Duan, Feng Tang, Guanyong Yan (2014). In situ aberration measurement method using a phase-shift ring mask.DOI
Chen-Ling Yu, Sikun Li, Xiang-Chao Wang (2014). The optical fringe phase extraction method based wavelet transform parallel computing gpu.
Guanyong Yan, Xiang-Zhao Wang, Sikun Li, Ji-Shuo Yang, Dongbo Xu (2014). Aberration measurement based on principal component analysis of aerial images of optimized marks.DOI
Guanyong Yan, Xiang-Zhao Wang, Sikun Li, Ji-Shuo Yang, Dongbo Xu, A. Erdmann (2014). Aberration measurement technique based on an analytical linear model of a through-focus aerial image. Optics Express.DOI
Xiao-Lei Liu, Xiang-Zhao Wang, Sikun Li, Guanyong Yan, A. Erdmann (2014). Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography. Advanced Lithography.DOI
Sikun Li, Xiang-Chao Wang, Ji-Shuo Yang, Guanyong Yan, Zhao-Ze Li (2014). Detection method of wave aberration and optical imaging focal plane of photoetching projection objective.
Lei Wang, Xiang-Chao Wang, Sikun Li, Guanyong Yan, Chao-Xing Yang (2014). Light source optimization method of photolithography machine.
Zhao-Ze Li, Sikun Li, Xiang-Zhao Wang (2014). Source and Mask Optimization Using Stochastic Parallel Gradient Descent Algorithm in Optical Lithography.DOI
Sikun Li, Xiang-Zhao Wang, Ji-Shuo Yang, Feng Tang, Guanyong Yan, A. Erdmann (2014). A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask. Advanced Lithography.DOI
Ji-Shuo Yang, Xiang-Zhao Wang, Sikun Li, Guanyong Yan (2014). In Situ Aberration Measurement Method Based on a Phase-Shift Rings Target.DOI
Chen-Ling Yu, Sikun Li, Xiang-Zhao Wang (2014). Fast Three-Dimensional Shape Measurement Technique by Means of Wavelet Transform Based on Parallel Computing.DOI
Xiao-Lei Liu, Sikun Li, Xiang-Zhao Wang (2014). Simplified Model for Defective Multilayer Diffraction Spectrum Simulation in Extreme Ultraviolet Lithography.DOI
Ji-Shuo Yang, Xiang-Zhao Wang, Sikun Li, L. Duan, Anatoly Bourov, A. Erdmann (2013). Adaptive denoising method to improve aberration measurement performance.DOI
L. Duan, Xiang-Zhao Wang, Dongbo Xu, Anatoly Bourov, Sikun Li (2013). Extended AMAI-PCA technique based on multi-level Box–Behnken design.DOI
Guanyong Yan, Xiang-Zhao Wang, Sikun Li, Ji-Shuo Yang, Dongbo Xu, L. Duan, Anatoly Bourov, A. Erdmann (2013). In situ aberration measurement technique based on an aerial image with an optimized source.DOI
Dongbo Xu, Sikun Li, Xiang-Zhao Wang, T. Fühner, A. Erdmann (2013). Defect parameters retrieval based on optical projection images. Optical Metrology.DOI
Chao-Xing Yang, Xiang-Zhao Wang, Sikun Li, A. Erdmann (2013). Source mask optimization using real-coded genetic algorithms. Advanced Lithography.DOI
Ji-Shuo Yang, Xiang-Chao Wang, Sikun Li, Guanyong Yan, Bo-Er Zhu (2013). Projection objective wave aberration detection method based on phase ring space image principle component analysis.
Sikun Li, Yong Xiao, Xiang-Zhao Wang (2013). Three-dimensional information security combined fringe projection with double random phase encoding.DOI
Ji-Shuo Yang, Xiang-Zhao Wang, Sikun Li, L. Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, A. Erdmann (2013). High-order aberration measurement technique based on a quadratic Zernike model with optimized source.DOI
Sikun Li, Xiang-Zhao Wang, Yang Bu (2013). Robust pixel-based source and mask optimization for inverse lithography.DOI
Jian Hu, Wenke Wang, Qianli Ma, Sikun Li (2012). Optimization and Implementation of Unstructured Grid Volume Rendering Algorithm. 《2012年计算机应用与系统建模国际会议论文集》.
Jiangfan Ning, Shi Lu, Bo Wu, Sikun Li (2012). Research and Implement of Rigid Body Fracturing Simulation Based on Ogre and Newton Engine. 《2012年计算机应用与系统建模国际会议》.
Huahai Liu, Pan Wang, Sikun Li, Xun Cai, Liang Zeng (2012). Research on Multi-CPU and Multi-GPU Scalable Parallel Rendering on Shared Memory Architecture. 《2012年计算机应用与系统建模国际会议论文集》.
Sikun Li, Xiang-Zhao Wang, Xianyu Su, Feng Tang (2012). Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern analysis. Applied Optics.DOI
Sikun Li, Xianyu Su, Wen-Jing Chen (2012). Hilbert assisted wavelet transform method of optical fringe pattern phase reconstruction for optical profilometry and interferometry.DOI
Yuanying Tu, Xiang-Zhao Wang, Sikun Li, L. Duan, Peng Bu (2012). Symmetric polarization aberration compensation method based on scalar aberration control for lithographic projection lens. Advanced Lithography.DOI
Guanyong Yan, Xiang-Zhao Wang, Sikun Li, Ji-Shuo Yang, Dongbo Xu, L. Duan, Anatoly Bourov, A. Erdmann (2012). In situ aberration measurement technique based on aerial image with optimized source. Optical Systems Design.DOI
Yuanying Tu, Xiang-Zhao Wang, Sikun Li, Yu-Ting Cao (2012). Analytical approach to the impact of polarization aberration on lithographic imaging. Optics Letters.DOI
Ji-Shuo Yang, Xiang-Zhao Wang, Sikun Li, L. Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, A. Erdmann (2012). In situ aberration measurement technique based on quadratic Zernike model. Optical Systems Design.DOI
Gang Sun, Jun-Jie Zhu, Sikun Li, Fang-Lin Mao, L. Duan (2012). The overlay performance optimization based on overlay manager system. Advanced Lithography.DOI
张伟,周航军,彭宇行,李思昆(2011). DVE系统中基于异步时钟模型的公平性控制方法. Proceedings of the 2011 International Conference on Future Computer Science and Application(FCSA 2011 V2).
Sikun Li, Xianyu Su, Wen-Jing Chen (2011). A new wavelet transform for reliability-guided phase unwrapping of optical fringe patterns.DOI
Wen-Jing Chen, Sikun Li, Yixiang Cai, Yue Zhao (2011). Analysis on fringe pattern demodulation by use of 2-D CWT.DOI
Sikun Li, Xianyu Su, Wen-Jing Chen (2011). Analytic Image Based Wavelet Transform Method for Phase Reconstruction of Optical Interferogram with Linear-Carrier.DOI
Yong-Liang Xiao, Xianyu Su, Sikun Li, Xiaoqing Liu, Shu-Guang Zeng (2011). Key rotation multiplexing for multiple-image optical encryption in the Fresnel domain.DOI
Sikun Li, Xianyu Su, Wen-Jing Chen (2010). Wavelet ridge techniques in optical fringe pattern analysis. Journal of The Optical Society of America A-optics Image Science and Vision.DOI
Yong-Fu Wen, Sikun Li, Haobo Cheng, Xianyu Su, Qican Zhang (2010). Universal calculation formula and calibration method in Fourier transform profilometry. Applied Optics.DOI
Sikun Li, Su Xianyu, Wen-Jing Chen (2010). Applications of Two-Dimensional Wavelet Transform on Phase Analysis of Spatial Carrier-Fringe Patterns.DOI
Sikun Li, Xianyu Su, Wen-Jing Chen (2009). Spatial carrier fringe pattern phase demodulation by use of a two-dimensional real wavelet. Applied Optics.DOI
Sikun Li, Xianyu Su, Wen-Jing Chen, Li-Qun Xiang (2009). Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decomposition. Journal of The Optical Society of America A-optics Image Science and Vision.DOI
Sikun Li, Wen-Jing Chen, Su Xianyu, Li-Qun Xiang (2009). Empirical Mode-Decomposition Method for Eliminating Extention of Zero Component in Fourier Transform Profilometry.DOI
Shengyu Shen, Ying Qin, SiKun Li (2005). A Faster Counterexample Minimization Algorithm Based on Refutation Analysis. Design, Automation, and Test in Europe.DOI
Shengyu Shen, Ying Qin, SiKun Li (2005). A fast counterexample minimization approach with refutation analysis and incremental SAT. Asia and South Pacific Design Automation Conference (ASP-DAC).DOI
Shengyu Shen, Ying Qin, SiKun Li (2004). Debugging complex counterexample of hardware system using control flow distance metrics. Conference proceedings.DOI